Inventor · disambiguated record
Ryu Nagai
Also filed as: NAGAI RYU
3 granted patents·5 pending applications·0 citations·filing 2021–2025
39Inventor score
Files withTOKYO ELECTRON LTD8
Top patents by PatentIndex Score
8 records- 0161US2025372358A1Substrate processing system and substrate processing method for acquiring plasma emission data inside a chamber and predicting a state inside the chamber by inputting the emission dataTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0255US12494354B2Substrate processing system, information processing apparatus, and information processing method for dynamic control of substrate plasma processingTOKYO ELECTRON LTD·Filed 2022·Granted Dec 9, 2025·0 cites·20 claims
- 0354US12072693B2Analysis device and analysis methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 27, 2024·0 cites·16 claims
- 0452US2025201606A1Substrate processing system and substrate abnormality detection methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0549US12347651B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 1, 2025·0 cites·19 claims
- 0649US2023170189A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0747US2025191889A1Plasma processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0839US2022075358A1Analysis device, plasma process control system, and recording mediumTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →