Inventor · disambiguated record
Ryuji Ohnishi
Also filed as: OHNISHI RYUJI
11 granted patents·39 citations·filing 1988–2014
86Inventor score
Top patents by PatentIndex Score
11 records- 0187US8722840B2Resist underlayer film forming composition, and method for forming resist pattern using the sameSAKAMOTO RIKIMARU·Filed 2011·Granted May 13, 2014·6 cites·8 claims
- 0280US9746768B2Resist overlayer film forming composition for lithography and method for producing semiconductor device using the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Aug 29, 2017·5 cites·4 claims
- 0373US8962234B2Resist underlayer film forming composition and method for forming resist pattern using the sameOHNISHI RYUJI·Filed 2012·Granted Feb 24, 2015·2 cites·9 claims
- 0463US9927705B2Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Mar 27, 2018·1 cites·4 claims
- 0563US9494864B2Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the sameNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 15, 2016·1 cites·12 claims
- 0660US9240327B2Resist underlayer film-forming composition for EUV lithography containing condensation polymerSAKAMOTO RIKIMARU·Filed 2012·Granted Jan 19, 2016·1 cites·8 claims
- 0753US9046768B2Resist overlayer film forming composition for lithographyNISSAN CHEMICAL IND LTD·Filed 2012·Granted Jun 2, 2015·0 cites·11 claims
- 0848US9448480B2Resist underlayer film formation composition and method for forming resist pattern using the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Sep 20, 2016·0 cites·10 claims
- 0946US4975971AMethod and apparatus for detecting significant difference of sheet materialFUTEC INC·Filed 1988·Granted Dec 4, 1990·18 cites·14 claims
- 1044US10113083B2Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compoundNISSAN CHEMICAL IND LTD·Filed 2014·Granted Oct 30, 2018·0 cites·12 claims
- 1129US5060281AMethod and apparatus for detecting disparity of cyclic length of printed patternsFUTEC INC·Filed 1991·Granted Oct 22, 1991·5 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →