Inventor · disambiguated record
Sandeep Disawal
Also filed as: DISAWAL SANDEEP
4 granted patents·7 pending applications·81 citations·filing 2003–2019
77Inventor score
Top patents by PatentIndex Score
11 records- 0190US7491422B2Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrateNANOINK INC·Filed 2005·Granted Feb 17, 2009·44 cites·23 claims
- 0287US8071168B2Micrometric direct-write methods for patterning conductive material and applications to flat panel display repairCRUCHON-DUPEYRAT SYLVAIN·Filed 2005·Granted Dec 6, 2011·17 cites·19 claims
- 0378US7691541B2Methods for additive repair of phase shift masks by selectively depositing nanometer-scale engineered structures on defective phase shiftersNANOINK INC·Filed 2003·Granted Apr 6, 2010·20 cites·33 claims
- 0457US2010297228A1Universal coating for imprinting identification featuresNANOLNK INC·Filed 2008·Application pending·0 cites
- 0552US2019193325A1Compact instrument with exchangeable modules for multiple microfabrication and/or nanofabrication methodsAMRO NABIL A·Filed 2019·Application pending·0 cites
- 0649US10252463B2Compact instrument with exchangeable modules for multiple microfabrication and/or nanofabrication methodsAMRO NABIL A·Filed 2015·Granted Apr 9, 2019·0 cites·15 claims
- 0743US2012104660A1Injection molding of micron and nano scale features for pharmaceutical brand protectionDISAWAL SANDEEP·Filed 2011·Application pending·0 cites
- 0843US2012100304A1Micrometric direct-write methods for patterning conductive material and applications to flat panel display repairCRUCHON-DUPEYRAT SYLVAIN·Filed 2011·Application pending·0 cites
- 0941US2013292879A1Molding of micron and nano scale featuresDISAWAL SANDEEP·Filed 2012·Application pending·0 cites
- 1037US2011014131A1Nanomolding micron and nano scale featuresNANOINK INC·Filed 2010·Application pending·0 cites
- 1131US2012164564A1Advanced photomask repairAMRO NABIL·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →