Inventor · disambiguated record
Sanae Furuya
Also filed as: FURUYA SANAE
10 granted patents·2 pending applications·40 citations·filing 2006–2011
85Inventor score
Top patents by PatentIndex Score
12 records- 0193US8221956B2Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compoundSHIONO DAIJU·Filed 2009·Granted Jul 17, 2012·20 cites·9 claims
- 0280US8642244B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2011·Granted Feb 4, 2014·3 cites·7 claims
- 0376US8475997B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compoundSHIONO DAIJU·Filed 2011·Granted Jul 2, 2013·2 cites·17 claims
- 0476US8088553B2Positive resist composition, method of forming resist pattern, and polymeric compoundSHIMIZU HIROAKI·Filed 2009·Granted Jan 3, 2012·4 cites·8 claims
- 0566US7914967B2Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Mar 29, 2011·1 cites·11 claims
- 0663US7989138B2Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 2, 2011·7 cites·19 claims
- 0762US8742038B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2009·Granted Jun 3, 2014·0 cites·28 claims
- 0861US8298745B2Polymeric compound, positive resist composition, and method of forming resist patternFURUYA SANAE·Filed 2008·Granted Oct 30, 2012·2 cites·5 claims
- 0947US2009186300A1Resist composition for liquid immersion lithography, method of forming resist pattern, and fluorine-containing copolymerTOKYO OHKA KOGYO CO LTD·Filed 2009·Application pending·0 cites
- 1046US7741008B2Positive resist composition, positive resist composition for thermal flow, and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jun 22, 2010·0 cites·8 claims
- 1145US2009061170A1Anisotropic film and method of manufacturing anisotropic filmTOKYO OHKA KOGYO CO LTD·Filed 2008·Application pending·0 cites
- 1238US8025923B2Method for manufacturing a structureTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Sep 27, 2011·1 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →