Inventor · disambiguated record
Sarpangala Hariharakeshava Hegde
Also filed as: HEGDE SARPANGALA H · HEGDE SARPANGALA HARIHARAKESHAVA
8 granted patents·4 pending applications·6 citations·filing 2015–2025
75Inventor score
Top patents by PatentIndex Score
12 records- 0185US11227741B2Scanning ion beam etchPLASMA THERM NES LLC·Filed 2019·Granted Jan 18, 2022·4 cites·60 claims
- 0274US9863036B2Wafer stage for symmetric wafer processingPLASMA-THERM NES LLC·Filed 2015·Granted Jan 9, 2018·2 cites·20 claims
- 0369US2024368752A1Dynamic seal system for a vacuum processing systemPLASMA THERM NES LLC·Filed 2023·Application pending·0 cites
- 0467US11646171B2Scanning ion beam etchPLASMA THERM NES LLC·Filed 2021·Granted May 9, 2023·0 cites·46 claims
- 0561US2025283209A1Ion beam depositionPLASMA THERM NES LLC·Filed 2025·Application pending·0 cites
- 0659US11901167B2Ion beam deposition target life enhancementPLASMA THERM NES LLC·Filed 2022·Granted Feb 13, 2024·0 cites·20 claims
- 0756US12176178B2Scanning ion beam deposition and etchPLASMA THERM NES LLC·Filed 2022·Granted Dec 24, 2024·0 cites·21 claims
- 0855US11784025B1Integral sweep in ion beam systemPLASMA THERM NES LLC·Filed 2022·Granted Oct 10, 2023·0 cites·20 claims
- 0954US12368117B2Electrostatic discharge prevention in ion beam systemPLASMA THERM NES LLC·Filed 2023·Granted Jul 22, 2025·0 cites·6 claims
- 1051US2023343557A1Virtual shutter in ion beam systemPLASMA THERM NES LLC·Filed 2022·Application pending·0 cites
- 1145US2021391150A1Plasma Source ConfigurationPLASMA THERM LLC·Filed 2020·Application pending·0 cites
- 1241US9865436B1Powered anode for ion source for DLC and reactive processesPLASMA-THERM LLC·Filed 2016·Granted Jan 9, 2018·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →