Inventor · disambiguated record
Satoru Mihara
Also filed as: MIHARA SATORU
17 granted patents·4 pending applications·388 citations·filing 1990–2023
94Inventor score
Files withFUJITSU LTD14MIHARA SATORU2SANYO ELECTRIC CO2PANASONIC ENERGY CO LTD1PANASONIC HOLDINGS CORP1
Top patents by PatentIndex Score
21 records- 0187US6509593B2Semiconductor device and method of manufacturing the sameFUJITSU LTD·Filed 2000·Granted Jan 21, 2003·50 cites·4 claims
- 0286US6287986B1Sputtering film forming method, sputtering film forming equipment, and semiconductor device manufacturing methodFUJITSU LTD·Filed 1999·Granted Sep 11, 2001·84 cites·19 claims
- 0383US4987284ADownstream microwave plasma processing apparatus having an improved coupling structure between microwave plasmaFUJITSU LTD·Filed 1990·Granted Jan 22, 1991·52 cites·12 claims
- 0478US5681780AManufacture of semiconductor device with ashing and etchingFUJITSU LTD·Filed 1995·Granted Oct 28, 1997·57 cites·21 claims
- 0573US6674633B2Process for producing a strontium ruthenium oxide protective layer on a top electrodeFUJITSU LTD·Filed 2001·Granted Jan 6, 2004·19 cites·8 claims
- 0668US5447598AProcess for forming resist mask patternFUJITSU LTD·Filed 1993·Granted Sep 5, 1995·54 cites·15 claims
- 0767US2025379301A1Sealed batteryPANASONIC ENERGY CO LTD·Filed 2023·Application pending·0 cites
- 0862US6913970B2Semiconductor device and method of manufacturing the sameFUJITSU LTD·Filed 2002·Granted Jul 5, 2005·10 cites·15 claims
- 0958US12381297B2Cylindrical non-aqueous electrolyte secondary cellSANYO ELECTRIC CO·Filed 2020·Granted Aug 5, 2025·0 cites·8 claims
- 1055US8283235B2Method of manufacturing semiconductor deviceMIHARA SATORU·Filed 2009·Granted Oct 9, 2012·1 cites·8 claims
- 1154US6020111AMethod of manufacturing semiconductor device with patterned lamination of Si film and metal filmFUJITSU LTD·Filed 1998·Granted Feb 1, 2000·15 cites·15 claims
- 1251US2025105434A1Power storage devicePANASONIC HOLDINGS CORP·Filed 2023·Application pending·0 cites
- 1351US2023135786A1Cylindrical batterySANYO ELECTRIC CO·Filed 2021·Application pending·0 cites
- 1448US5560803APlasma ashing method with oxygen pretreatmentFUJITSU LTD·Filed 1994·Granted Oct 1, 1996·18 cites·13 claims
- 1546US8482097B2Semiconductor deviceMIHARA SATORU·Filed 2012·Granted Jul 9, 2013·0 cites·8 claims
- 1640US5750208AMethod for plasma downstream processingFUJITSU LTD·Filed 1996·Granted May 12, 1998·4 cites·11 claims
- 1739US6044850ASemiconductor device manufacturing method including ashing processFUJITSU LTD·Filed 1997·Granted Apr 4, 2000·9 cites·21 claims
- 1838US5562775APlasma downstream processingFUJITSU LTD·Filed 1995·Granted Oct 8, 1996·3 cites·8 claims
- 1938US2004062762A1Method of sterilizing antibody-containing milk and products containing sterilized antibody-containing milkFiled 2001·Application pending·0 cites
- 2037US6071828ASemiconductor device manufacturing method including plasma etching stepFUJITSU LTD·Filed 1999·Granted Jun 6, 2000·6 cites·11 claims
- 2132US5030316ATrench etching processFUJITSU LTD·Filed 1990·Granted Jul 9, 1991·6 cites·3 claims
Join the waitlist — get patent alerts
Get an alert when Satoru Mihara files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →