Inventor · disambiguated record
Satoshi Ohuchida
Also filed as: OHUCHIDA SATOSHI
5 granted patents·10 pending applications·2 citations·filing 2020–2025
64Inventor score
Files withTOKYO ELECTRON LTD15
Top patents by PatentIndex Score
15 records- 0188US12400835B2Plasma processing method and plasma processing systemTOKYO ELECTRON LTD·Filed 2022·Granted Aug 26, 2025·1 cites·19 claims
- 0282US11798793B2Substrate processing method, component processing method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 24, 2023·1 cites·17 claims
- 0378US2025349552A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0473US2025323055A1Etching methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0570US12387941B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Aug 12, 2025·0 cites·19 claims
- 0669US2023395390A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0765US2023268191A1Etching methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0864US2024006168A1Substrate processing method, component processing method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0961US2022165578A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1058US2024203698A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1157US11139169B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 5, 2021·0 cites·10 claims
- 1256US2024112918A1Plasma processing system, plasma processing apparatus, and etching methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1356US2024063026A1Etching methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1454US11417535B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 16, 2022·0 cites·17 claims
- 1554US2023377850A1Etching method and plasma processing systemTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →