Inventor · disambiguated record
Satoshi Okazaki
Also filed as: OKAZAKI SATOSHI
54 granted patents·9 pending applications·596 citations·filing 1982–2025
98Inventor score
Top patents by PatentIndex Score
63 records- 0198US4431789ANovel organopolysiloxane having alcoholic hydroxy groups and a method for the preparation thereofSHINETSU CHEMICAL CO·Filed 1982·Granted Feb 14, 1984·148 cites·5 claims
- 0296US7767366B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 3, 2010·34 cites·23 claims
- 0395US8012654B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Sep 6, 2011·11 cites·22 claims
- 0495US7771893B2Photomask blank, photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2006·Granted Aug 10, 2010·28 cites·20 claims
- 0594US8003284B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Aug 23, 2011·9 cites·23 claims
- 0694US5127330AMethod including treatment of ink on a plate to cause hardening at other than the ink outer surface before printingDAINIPPON PRINTING CO LTD·Filed 1990·Granted Jul 7, 1992·72 cites·19 claims
- 0792US7736824B2Photomask blank, photomask, and method of manufactureSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 15, 2010·26 cites·11 claims
- 0890US7989124B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2010·Granted Aug 2, 2011·6 cites·19 claims
- 0989US7767367B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2007·Granted Aug 3, 2010·10 cites·35 claims
- 1089US7691546B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 6, 2010·10 cites·8 claims
- 1187US7625676B2Photomask blank, photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2005·Granted Dec 1, 2009·13 cites·24 claims
- 1286US7790339B2Photomask blankSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 7, 2010·8 cites·7 claims
- 1386US7618753B2Photomask blank, photomask and method for producing thoseSHINETSU CHEMICAL CO·Filed 2005·Granted Nov 17, 2009·8 cites·20 claims
- 1483US7179545B2Halftone phase shift mask blank, and method of manufactureSHINETSU CHEMICAL CO·Filed 2003·Granted Feb 20, 2007·20 cites·12 claims
- 1581US5422221AResist compositionsSHINETSU CHEMICAL CO·Filed 1994·Granted Jun 6, 1995·28 cites·9 claims
- 1677US8007964B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Aug 30, 2011·2 cites·17 claims
- 1777US6511778B2Phase shift mask blank, phase shift mask and method of manufactureSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·15 cites·20 claims
- 1874US11320735B2Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acidJSR CORP·Filed 2019·Granted May 3, 2022·1 cites·20 claims
- 1974US7622228B2Halftone phase shift mask blank, and method of manufactureSHINETSU CHEMICAL CO·Filed 2006·Granted Nov 24, 2009·1 cites·5 claims
- 2073US7622227B2Phase-shift photomask-blank, phase-shift photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2006·Granted Nov 24, 2009·3 cites·20 claims
- 2172US7556892B2Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer methodSHINETSU CHEMICAL CO·Filed 2005·Granted Jul 7, 2009·3 cites·28 claims
- 2271US7625677B2Half-tone stacked film, photomask-blank, photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 1, 2009·3 cites·26 claims
- 2371US7419749B2Halftone phase shift mask blank, halftone phase shift mask and their preparationSHINETSU CHEMICAL CO·Filed 2005·Granted Sep 2, 2008·1 cites·12 claims
- 2471US6218069B1Photosensitive resin composition and making processSHINETSU CHEMICAL CO·Filed 2000·Granted Apr 17, 2001·11 cites·3 claims
- 2570US6666957B2Magnetron sputtering system and photomask blank production method based on the sameSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 23, 2003·8 cites·21 claims
- 2669US9739748B2Gas sensor and gas detection elementNGK SPARK PLUG CO·Filed 2015·Granted Aug 22, 2017·1 cites·8 claims
- 2768US10012611B2Gas sensor element and gas sensorNGK SPARK PLUG CO·Filed 2015·Granted Jul 3, 2018·1 cites·6 claims
- 2867US6503669B2Photomask blank, photomask and method of manufactureSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 7, 2003·8 cites·6 claims
- 2966US2025146220A1Papermaking felt base member and papermaking feltICHIKAWA CO LTD·Filed 2024·Application pending·0 cites
- 3063US2025198084A1Base fabric for papermaking felt and papermaking felt made by jointing sameICHIKAWA CO LTD·Filed 2022·Application pending·0 cites
- 3162US5773200APositive resist composition suitable for lift-off technique and pattern forming methodSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 30, 1998·22 cites·10 claims
- 3260US2025164877A1Radiation-sensitive composition, method for forming resist pattern, and radiation-sensitive acid generatorJSR CORP·Filed 2025·Application pending·0 cites
- 3359US6790129B2Method for polishing angular substratesSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 14, 2004·7 cites·13 claims
- 3459US6514642B2Phase shift mask and method of manufactureSHINETSU CHEMICAL CO·Filed 2001·Granted Feb 4, 2003·5 cites·20 claims
- 3559US6383944B1Micropatterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted May 7, 2002·22 cites·16 claims
- 3658US6641958B2Phase shift mask blank, phase shift mask, and methods of manufactureSHINETSU CHEMICAL CO·Filed 2001·Granted Nov 4, 2003·6 cites·16 claims
- 3757US12386260B2Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compoundJSR CORP·Filed 2022·Granted Aug 12, 2025·0 cites·20 claims
- 3857US7598004B2Film-depositing target and preparation of phase shift mask blankSHINETSU CHEMICAL CO·Filed 2005·Granted Oct 6, 2009·0 cites·5 claims
- 3957US6589699B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 8, 2003·4 cites·20 claims
- 4057US6503668B2Phase shift mask blank, phase shift mask, and method of manufactureSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 7, 2003·4 cites·11 claims
- 4156US7329474B2Photomask blank, photomask, and method of manufactureSHIN ESTU CHEMICAL CO LTD·Filed 2004·Granted Feb 12, 2008·3 cites·21 claims
- 4255US7122280B2Angular substratesSHINETSU CHEMICAL CO·Filed 2002·Granted Oct 17, 2006·4 cites·14 claims
- 4354US2009057143A1Film-depositing target and preparation of phase shift mask blankYOSHIKAWA HIROKI·Filed 2008·Application pending·0 cites
- 4452US11535569B2Method for manufacturing sensor elementNGK SPARK PLUG CO·Filed 2020·Granted Dec 27, 2022·0 cites·4 claims
- 4551US7351505B2Phase shift mask blank, phase shift mask, and pattern transfer methodSHINETSU CHEMICAL CO·Filed 2004·Granted Apr 1, 2008·3 cites·9 claims
- 4650US7179567B2Phase shift mask blank, phase shift mask, and method of manufactureSHINETSU CHEMICAL CO·Filed 2003·Granted Feb 20, 2007·3 cites·15 claims
- 4749US7037625B2Phase shift mask blank and method of manufactureSHINETSU CHEMICAL CO·Filed 2002·Granted May 2, 2006·2 cites·18 claims
- 4849US6733930B2Photomask blank, photomask and method of manufactureSHINETSU CHEMICAL CO·Filed 2002·Granted May 11, 2004·2 cites·15 claims
- 4949US6242151B1Polymers, resist compositions and patterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted Jun 5, 2001·9 cites·9 claims
- 5049US6221989B1Polymers and positive resist compositionsSHINETSU CHEMICAL CO·Filed 1999·Granted Apr 24, 2001·8 cites·17 claims
Showing the top 50 of 63 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Satoshi Okazaki files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →