Inventor · disambiguated record
Sang-Jine Park
Also filed as: PARK SANG JINE
35 granted patents·8 pending applications·147 citations·filing 2005–2025
96Inventor score
Top patents by PatentIndex Score
43 records- 0198US9299700B2Semiconductor devices including a dummy gate structure on a finPARK SANG-JINE·Filed 2015·Granted Mar 29, 2016·33 cites·20 claims
- 0294US9755079B2Semiconductor devices including insulating gates and methods for fabricating the samePARK SANG-JINE·Filed 2016·Granted Sep 5, 2017·13 cites·8 claims
- 0394US9548309B2Semiconductor devices including a dummy gate structure on a finPARK SANG-JINE·Filed 2016·Granted Jan 17, 2017·10 cites·7 claims
- 0493US9704864B2Semiconductor devices including an isolation layer on a fin and methods of forming semiconductor devices including an isolation layer on a finPARK SANG-JINE·Filed 2015·Granted Jul 11, 2017·14 cites·19 claims
- 0588US10192973B2Methods of forming semiconductor devices including trench walls having multiple slopesSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jan 29, 2019·5 cites·17 claims
- 0688US9947672B2Semiconductor devices including a dummy gate structure on a finSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 17, 2018·4 cites·8 claims
- 0786US10096605B2Semiconductor devices including a dummy gate structure on a finSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 9, 2018·3 cites·16 claims
- 0886US9443979B2Semiconductor devices including trench walls having multiple slopesPARK SANG-JINE·Filed 2014·Granted Sep 13, 2016·7 cites·20 claims
- 0986US8673724B2Methods of fabricating semiconductor devicesPARK SANG-JINE·Filed 2012·Granted Mar 18, 2014·9 cites·20 claims
- 1085US11664243B2Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted May 30, 2023·4 cites·10 claims
- 1184US10128236B2Semiconductor device and method for fabricating the sameJEONG JI MIN·Filed 2016·Granted Nov 13, 2018·6 cites·16 claims
- 1283US10985036B2Substrate processing apparatus and apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 20, 2021·3 cites·17 claims
- 1382US8803248B2Semiconductor devices and methods of manufacturing the samePARK SANG-JINE·Filed 2011·Granted Aug 12, 2014·5 cites·6 claims
- 1481US10128246B2Semiconductor devices including an isolation layer on a fin and methods of forming semiconductor devices including an isolation layer on a finSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Nov 13, 2018·3 cites·17 claims
- 1579US10734380B2Semiconductor device and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Aug 4, 2020·2 cites·3 claims
- 1679US9466697B2Semiconductor devices and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Oct 11, 2016·2 cites·8 claims
- 1774US10438891B2Integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 8, 2019·2 cites·17 claims
- 1874US7902082B2Method of forming field effect transistors using diluted hydrofluoric acid to remove sacrificial nitride spacersSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Mar 8, 2011·5 cites·10 claims
- 1974US2025273455A1Substrate drying apparatus and semiconductor device manufacturing method using sameSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 2072US7923365B2Methods of forming field effect transistors having stress-inducing sidewall insulating spacers thereonSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Apr 12, 2011·4 cites·15 claims
- 2171US8652915B2Methods of fabricating semiconductor devices using preliminary trenches with epitaxial growthAHN KEVIN·Filed 2011·Granted Feb 18, 2014·4 cites·16 claims
- 2270US10438799B2Methods of fabricating semiconductor devices including support patternsSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 8, 2019·1 cites·14 claims
- 2369US9054210B2Method of fabricating semiconductor devicePARK SANG-JINE·Filed 2012·Granted Jun 9, 2015·2 cites·19 claims
- 2468US9754880B2Semiconductor devices including a contact structure and methods of manufacturing the sameBAEK JAE-JIK·Filed 2016·Granted Sep 5, 2017·2 cites·19 claims
- 2567US12322587B2Substrate drying apparatus and semiconductor device manufacturing method using sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jun 3, 2025·0 cites·20 claims
- 2667US8404580B2Methods for fabricating semiconductor devicesPARK SANG-JINE·Filed 2012·Granted Mar 26, 2013·2 cites·20 claims
- 2765US9613811B2Methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 4, 2017·1 cites·17 claims
- 2864US9040415B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 26, 2015·1 cites·20 claims
- 2962US11887868B2Substrate processing apparatus and apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jan 30, 2024·0 cites·17 claims
- 3061US10446561B2Semiconductor devices including a dummy gate structure on a finSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 15, 2019·0 cites·20 claims
- 3158US12468227B2Apparatus and method for processing substrateSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Nov 11, 2025·0 cites·19 claims
- 3252US2014322881A1Semiconductor devices and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 3352US2018197861A1Semiconductor devices including varied depth recesses for contactsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 3450US9985106B2Semiconductor devices utilizing spacer structuresSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted May 29, 2018·0 cites·10 claims
- 3549US2010139715A1Cleaning Equipment and Cleaning MethodPARK SANG-JINE·Filed 2009·Application pending·0 cites
- 3648US2016351570A1Semiconductor devices including varied depth recesses for contactsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 3744US10297474B2Chemical supplier, processing apparatus including the chemical supplierSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 21, 2019·0 cites·21 claims
- 3844US8709942B2Methods for fabricating semiconductor devicesPARK SANG-JINE·Filed 2012·Granted Apr 29, 2014·0 cites·20 claims
- 3943US10818522B2Process chamber for a supercritical process and apparatus for treating substrates having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 27, 2020·0 cites·17 claims
- 4042US2006163208A1Photoresist stripping composition and methods of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 4140US7585763B2Methods of fabricating integrated circuit devices using anti-reflective coating as implant blocking layerSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Sep 8, 2009·0 cites·15 claims
- 4239US2011156110A1Field Effect Transistors Having Gate Electrode Silicide Layers with Reduced Surface DamageKIM JUN-JUNG·Filed 2011·Application pending·0 cites
- 4338US2012049250A1Semiconductor Integrated Circuit Device Including an Epitaxial LayerPARK SANG-JINE·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →