Inventor · disambiguated record
Satish Srinivasan
Also filed as: SRINIVASAN SATISH
10 granted patents·16 pending applications·8 citations·filing 2008–2023
82Inventor score
Top patents by PatentIndex Score
26 records- 0179US12198902B2Laminated aerosol deposition coating for aluminum components for plasma processing chambersLAM RES CORP·Filed 2020·Granted Jan 14, 2025·1 cites·8 claims
- 0273US8211846B2Materials for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2008·Granted Jul 3, 2012·3 cites·19 claims
- 0373US8084406B2Apparatus for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2008·Granted Dec 27, 2011·3 cites·11 claims
- 0467US10326335B2Radial counter flow jet cooling systemGENERAL ELECTRIC TECHNOLOGY GMBH·Filed 2016·Granted Jun 18, 2019·1 cites·16 claims
- 0563US2025140528A1Yttria coating for plasma processing chamber componentsLAM RES CORP·Filed 2023·Application pending·0 cites
- 0662US12249490B2Single crystal metal oxide plasma chamber componentLAM RES CORP·Filed 2020·Granted Mar 11, 2025·0 cites·11 claims
- 0760US11349373B2Radial counter flow jet cooling systemGENERAL ELECTRIC TECHNOLOGY GMBH·Filed 2019·Granted May 31, 2022·0 cites·15 claims
- 0860US2021343510A1Quartz component with protective coatingLAM RES CORP·Filed 2021·Application pending·0 cites
- 0958US12129569B2Method for conditioning semiconductor processing chamber componentsLAM RES CORP·Filed 2021·Granted Oct 29, 2024·0 cites·7 claims
- 1057US2025357171A1Chucking system with silane coupling agentLAM RES CORP·Filed 2023·Application pending·0 cites
- 1155US2025191893A1Spark plasma sintered component for cryo-plasma processingLAM RES CORP·Filed 2023·Application pending·0 cites
- 1255US2023331633A1Spark plasma sintered component for plasma processing chamberLAM RES CORP·Filed 2021·Application pending·0 cites
- 1354US11087961B2Quartz component with protective coatingLAM RES CORP·Filed 2018·Granted Aug 10, 2021·0 cites·31 claims
- 1454US8226775B2Methods for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2008·Granted Jul 24, 2012·0 cites·24 claims
- 1552US2022002863A1Plasma processing chamberLAM RES CORP·Filed 2019·Application pending·0 cites
- 1652US2023088848A1Yttrium aluminum coating for plasma processing chamber componentsLAM RES CORP·Filed 2021·Application pending·0 cites
- 1752US2025246413A1Coated part for plasma processing chamberLAM RES CORP·Filed 2022·Application pending·0 cites
- 1851US2012132234A1Apparatus for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2011·Application pending·0 cites
- 1950US2024308926A1Treated ceramic chamber partsLAM RES CORP·Filed 2022·Application pending·0 cites
- 2049US2023020387A1Low temperature sintered coatings for plasma chambersLAM RES CORP·Filed 2020·Application pending·0 cites
- 2149US2024212991A1Yttrium aluminum perovskite (yap) based coatings for semiconductor processing chamber componentsLAM RES CORP·Filed 2022·Application pending·0 cites
- 2247US9947558B2Method for conditioning silicon partLAM RES CORP·Filed 2016·Granted Apr 17, 2018·0 cites·13 claims
- 2346US2014232220A1Rotor of an electric machineALSTOM TECHNOLOGY LTD·Filed 2014·Application pending·0 cites
- 2441US2022093370A1Textured silicon semiconductor processing chamber componentsLAM RES CORP·Filed 2020·Application pending·0 cites
- 2539US2016375515A1Use of atomic layer deposition coatings to protect brazing line against corrosion, erosion, and arcingLAM RES CORP·Filed 2015·Application pending·0 cites
- 2638US2017018408A1Use of sintered nanograined yttrium-based ceramics as etch chamber componentsLAM RES CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →