Inventor · disambiguated record
Satoshi Takei
Also filed as: TAKEI SATOSHI
22 granted patents·2 pending applications·158 citations·filing 1987–2024
95Inventor score
Files withNISSAN CHEMICAL IND LTD12TAKEI SATOSHI6HORIGUCHI YUSUKE2BREWER SCIENCE1HOKURIKU PHARMACEUTICAL1
Top patents by PatentIndex Score
24 records- 0190US8048615B2Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coatingNISSAN CHEMICAL IND LTD·Filed 2006·Granted Nov 1, 2011·17 cites·10 claims
- 0287US6444320B1Thermosetting anti-reflective coatings for full-fill dual damascene processBREWER SCIENCE·Filed 2001·Granted Sep 3, 2002·34 cites·53 claims
- 0381US8481247B2Resist underlayer film forming composition containing liquid additiveHORIGUCHI YUSUKE·Filed 2007·Granted Jul 9, 2013·9 cites·5 claims
- 0479US7842620B2Method for manufacturing semiconductor device using quadruple-layer laminateNISSAN CHEMICAL IND LTD·Filed 2007·Granted Nov 30, 2010·6 cites·10 claims
- 0578US8426111B2Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coatingTAKEI SATOSHI·Filed 2006·Granted Apr 23, 2013·6 cites·12 claims
- 0675US9946158B2Composition for forming resist underlayer film for nanoimprintNISSAN CHEMICAL IND LTD·Filed 2014·Granted Apr 17, 2018·1 cites·11 claims
- 0773US7687223B2Underlayer coating forming composition for lithography containing cyclodextrin compoundNISSAN CHEMICAL IND LTD·Filed 2005·Granted Mar 30, 2010·4 cites·12 claims
- 0872US9134610B2Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coatingNISSAN CHEMICAL IND LTD·Filed 2013·Granted Sep 15, 2015·2 cites·16 claims
- 0971US7727902B2Composition for forming nitride coating film for hard maskNISSAN CHEMICAL IND LTD·Filed 2004·Granted Jun 1, 2010·13 cites·2 claims
- 1069US8088546B2Underlayer coating forming composition for lithography containing naphthalene ring having halogen atomTAKEI SATOSHI·Filed 2005·Granted Jan 3, 2012·2 cites·10 claims
- 1164US2025131403A1Information processing system and information processing methodTOSHIBA TEC KK·Filed 2024·Application pending·0 cites
- 1263US7361718B2Alkali-soluble gap fill material forming composition for lithographyNISSAN CHEMICAL IND LTD·Filed 2003·Granted Apr 22, 2008·9 cites·11 claims
- 1361US8007979B2Acrylic polymer-containing gap fill material forming composition for lithographyNISSAN CHEMICAL IND LTD·Filed 2004·Granted Aug 30, 2011·6 cites·6 claims
- 1460US10509320B2Underlying coating forming composition for lithography containing compound having protected carboxyl groupTAKEI SATOSHI·Filed 2006·Granted Dec 17, 2019·1 cites·8 claims
- 1560US7226721B2Underlayer coating forming composition for lithography containing compound having protected carboxyl groupNISSAN CHEMICAL IND LTD·Filed 2004·Granted Jun 5, 2007·15 cites·15 claims
- 1653US7425347B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2002·Granted Sep 16, 2008·6 cites·16 claims
- 1750US8283103B2Composition for forming resist underlayer film for lithography and production method of semiconductor deviceIMAMURA HIKARU·Filed 2008·Granted Oct 9, 2012·0 cites·11 claims
- 1850US7365023B2Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coatingNISSAN CHEMICAL IND LTD·Filed 2004·Granted Apr 29, 2008·2 cites·7 claims
- 1948US7517633B2Composition for forming gap-filling material for lithographyNISSAN CHEMICAL IND LTD·Filed 2001·Granted Apr 14, 2009·9 cites·12 claims
- 2047US8227172B2Method of producing semiconductor device using resist underlayer film by photo-crosslinking curingHORIGUCHI YUSUKE·Filed 2007·Granted Jul 24, 2012·3 cites·3 claims
- 2147US4780465AAqueous solution containing a quinolone carboxylic acidHOKURIKU PHARMACEUTICAL·Filed 1987·Granted Oct 25, 1988·12 cites·7 claims
- 2247US2012128891A1Composition for forming resist underlayer film for nanoimprintTAKEI SATOSHI·Filed 2010·Application pending·0 cites
- 2345US8916327B2Underlayer coating forming composition containing dextrin ester compoundTAKEI SATOSHI·Filed 2004·Granted Dec 23, 2014·1 cites·10 claims
- 2429US8163460B2Underlayer coating forming composition for lithography containing polysilane compoundTAKEI SATOSHI·Filed 2006·Granted Apr 24, 2012·0 cites·6 claims
Join the waitlist — get patent alerts
Get an alert when Satoshi Takei files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →