Inventor · disambiguated record
Satoru Teruuchi
Also filed as: TERUUCHI Satoru
5 granted patents·5 pending applications·4 citations·filing 2015–2025
67Inventor score
Files withTOKYO ELECTRON LTD10
Top patents by PatentIndex Score
10 records- 0181US11373884B2Placing table and plasma treatment apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 28, 2022·1 cites·8 claims
- 0276US10679869B2Placing table and plasma treatment apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 9, 2020·2 cites·5 claims
- 0367US12424424B2Plasma monitoring system, plasma monitoring method, and monitoring deviceTOKYO ELECTRON LTD·Filed 2023·Granted Sep 23, 2025·0 cites·18 claims
- 0465US2024068921A1Particle monitoring system, particle monitoring method, and monitoring deviceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0562US12142501B2Substrate processing system and temperature control methodTOKYO ELECTRON LTD·Filed 2021·Granted Nov 12, 2024·0 cites·9 claims
- 0659US10699883B2Plasma processing apparatus, method of operating plasma processing apparatus, and power supply deviceTOKYO ELECTRON LTD·Filed 2015·Granted Jun 30, 2020·1 cites·12 claims
- 0759US2024194459A1Processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0859US2024213000A1Processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0955US2025232956A1Plasma processing deviceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1048US2017372928A1Substrate processing system and temperature control methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →