Inventor · disambiguated record
Satoshi Toda
Also filed as: TODA SATOSHI
11 granted patents·5 pending applications·10 citations·filing 2015–2022
82Inventor score
Top patents by PatentIndex Score
16 records- 0176US9490151B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2015·Granted Nov 8, 2016·3 cites·20 claims
- 0273US10256107B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Apr 9, 2019·2 cites·9 claims
- 0371US10460949B2Substrate processing apparatus, substrate processing method and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Oct 29, 2019·2 cites·10 claims
- 0471US9691631B2Etching method and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jun 27, 2017·2 cites·9 claims
- 0565US12215417B2Substrate processing method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Granted Feb 4, 2025·0 cites·12 claims
- 0664US9646848B2Etching method, etching apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted May 9, 2017·1 cites·5 claims
- 0754US12283489B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 0852US11764070B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Sep 19, 2023·0 cites·19 claims
- 0952US11335567B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 17, 2022·0 cites·16 claims
- 1048US2019153599A1Substrate processing method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1144US2021090912A1Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1244US2022068657A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1343US10221109B2Method for producing alpha-olefin low polymerMITSUBISHI CHEM CORP·Filed 2016·Granted Mar 5, 2019·0 cites·12 claims
- 1439US11127597B2Etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Sep 21, 2021·0 cites·15 claims
- 1533US2015380268A1Etching method and storage mediumTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1632US2019378724A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →