Inventor · disambiguated record
Seiji Nishikawa
Also filed as: NISHIKAWA SEIJI
6 granted patents·10 pending applications·210 citations·filing 1980–2022
84Inventor score
Files withMITSUBISHI HEAVY IND LTD4NISHIKAWA SEIJI3NEC CORP2KOKUSAI ELECTRIC CO LTD1MATSUDA RYUICHI1
Top patents by PatentIndex Score
16 records- 0188US5079559ADual plate antennaNEC CORP·Filed 1989·Granted Jan 7, 1992·74 cites·7 claims
- 0283US5193220ADevice for mounting an electronic partNEC CORP·Filed 1990·Granted Mar 9, 1993·73 cites·12 claims
- 0370US5054120AReceiver for personal radio paging serviceKOKUSAI ELECTRIC CO LTD·Filed 1991·Granted Oct 1, 1991·44 cites·4 claims
- 0457US2007288293A1Apparatus and method for displaying information relating business schedulesNTT DOCOMO INC·Filed 2007·Application pending·0 cites
- 0555US4950900AHeated infrared gas analyzer using a pyroelectric infrared sensorSANYO ELECTRIC CO·Filed 1989·Granted Aug 21, 1990·15 cites·5 claims
- 0654US2025064702A1Oil-in-water emulsion cosmeticSHISEIDO CO LTD·Filed 2022·Application pending·0 cites
- 0754US2002152108A1Apparatus and method for displaying information concerning business scheduleFiled 2001·Application pending·0 cites
- 0853US2003139960A1Method and device to hadling cost apportionmentFiled 2002·Application pending·0 cites
- 0951US2010310791A1Plasma processing method and plasma processing systemMITSUBISHI HEAVY IND LTD·Filed 2009·Application pending·0 cites
- 1049US2014057459A1Plasma processing method and plasma processing systemMITSUBISHI HEAVY IND LTD·Filed 2013·Application pending·0 cites
- 1145US2010236482A1Plasma film forming apparatusMITSUBISHI HEAVY IND LTD·Filed 2008·Application pending·0 cites
- 1237US8889568B2Method and apparatus for producing silicon nitride filmNISHIKAWA SEIJI·Filed 2011·Granted Nov 18, 2014·0 cites·6 claims
- 1337US2013088146A1Inductively coupled plasma generation deviceMATSUDA RYUICHI·Filed 2011·Application pending·0 cites
- 1436US4353237AMethod of rolling stripMITSUBISHI HEAVY IND LTD·Filed 1980·Granted Oct 12, 1982·4 cites·2 claims
- 1529US2013075875A1Silicon nitride film of semiconductor element, and method and apparatus for producing silicon nitride filmNISHIKAWA SEIJI·Filed 2011·Application pending·0 cites
- 1628US2013071671A1Silicon nitride film for semiconductor element, and method and apparatus for manufacturing silicon nitride filmNISHIKAWA SEIJI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →