Inventor · disambiguated record
Seung-Young Son
Also filed as: SON SEUNG · SON SEUNG-YOUNG
14 granted patents·4 pending applications·64 citations·filing 2002–2025
90Inventor score
Files withSAMSUNG ELECTRONICS CO LTD12APPLIED MATERIALS INC4CHO SUNG-IL1SAMSUNG ELECTRONICS COL LTD1
Top patents by PatentIndex Score
18 records- 0191US9653311B13D NAND staircase CD fabrication utilizing ruthenium materialAPPLIED MATERIALS INC·Filed 2016·Granted May 16, 2017·12 cites·19 claims
- 0279US6867096B2Method of fabricating semiconductor device having capacitorSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Mar 15, 2005·16 cites·18 claims
- 0377US7291531B2Method of fabricating semiconductor device having capacitorSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Nov 6, 2007·4 cites·8 claims
- 0474US12255055B2Integrated cleaning process for substrate etchingAPPLIED MATERIALS INC·Filed 2022·Granted Mar 18, 2025·0 cites·18 claims
- 0572US2025183016A1Integrated cleaning process for substrate etchingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0667US7098135B2Semiconductor device including bit line formed using damascene technique and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 29, 2006·9 cites·11 claims
- 0761US7226867B2Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gasSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 5, 2007·7 cites·25 claims
- 0860US6753221B2Methods for fabricating semiconductor devices having capacitorsSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jun 22, 2004·7 cites·25 claims
- 0959US11521838B2Integrated cleaning process for substrate etchingAPPLIED MATERIALS INC·Filed 2018·Granted Dec 6, 2022·0 cites·20 claims
- 1058US6927126B2Method of manufacturing semiconductor device with interconnections and interconnection contacts and a device formed therebySAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 9, 2005·8 cites·18 claims
- 1156US7736970B2Method of fabricating semiconductor device having capacitorSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 15, 2010·0 cites·12 claims
- 1251US8941165B2Methods of fabricating integrated circuit capacitors having u-shaped lower capacitor electrodesCHO SUNG-IL·Filed 2010·Granted Jan 27, 2015·0 cites·18 claims
- 1350US2006284277A1Semiconductor device including bit line formed using damascene technique and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1449US2023406822A1Silicon compound and method of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1547US2023407051A1Process of forming silicon-containing film and method of manufacturing integrated circuit device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1646US7256143B2Semiconductor device having self-aligned contact plug and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 14, 2007·0 cites·8 claims
- 1744US6875690B2Semiconductor device having self-aligned contact plug and method for fabricating the sameSAMSUNG ELECTRONICS COL LTD·Filed 2003·Granted Apr 5, 2005·1 cites·12 claims
- 1839US7307703B2Methods of determining an etching end point based on compensation for etching disturbancesSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Dec 11, 2007·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →