Inventor · disambiguated record
Seiichi Tagawa
Also filed as: TAGAWA SEIICHI
14 granted patents·3 pending applications·29 citations·filing 2000–2021
88Inventor score
Top patents by PatentIndex Score
17 records- 0190US10025187B2Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprintingTOKYO ELECTRON LTD·Filed 2015·Granted Jul 17, 2018·8 cites·41 claims
- 0285US10429745B2Photo-sensitized chemically amplified resist (PS-CAR) simulationTOKYO ELECTRON LTD·Filed 2016·Granted Oct 1, 2019·3 cites·24 claims
- 0379US10073349B2Chemically amplified resist material, pattern-forming method, compound, and production method of compoundUNIV OSAKA·Filed 2016·Granted Sep 11, 2018·2 cites·19 claims
- 0477US10670967B2Resist patterning method, latent resist image forming device, resist patterning device, and resist materialUNIV OSAKA·Filed 2018·Granted Jun 2, 2020·1 cites·19 claims
- 0570US9977332B2Resist patterning method, latent resist image forming device, resist patterning device, and resist materialUNIV OSAKA·Filed 2014·Granted May 22, 2018·1 cites·19 claims
- 0669US10025190B2Substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Jul 17, 2018·2 cites·12 claims
- 0766US7354637B2Damper and process thereofFUKOKU KK·Filed 2005·Granted Apr 8, 2008·5 cites·4 claims
- 0859US12492945B2Temperature distribution learning apparatusDAIKIN IND LTD·Filed 2021·Granted Dec 9, 2025·0 cites·14 claims
- 0955US2016193756A1Microstructural materials and fabrication method thereofDAIKIN IND LTD·Filed 2016·Application pending·0 cites
- 1051US6984432B2Damper and process thereofFUKOKU KK·Filed 2000·Granted Jan 10, 2006·5 cites·2 claims
- 1149US11796919B2Resist pattern formation methodUNIV OSAKA·Filed 2019·Granted Oct 24, 2023·0 cites·12 claims
- 1247US2012231220A1Microstructural materials and fabrication method thereofOSHIMA AKIHIRO·Filed 2011·Application pending·0 cites
- 1340US11187984B2Resist patterning method and resist materialUNIV OSAKA·Filed 2016·Granted Nov 30, 2021·0 cites·10 claims
- 1440US7731927B2Ceramic nanowires and a process for producing them by ion beam irradiationJAPAN ATOMIC ENERGY AGENCY·Filed 2006·Granted Jun 8, 2010·2 cites·13 claims
- 1537US9971247B2Pattern-forming methodUNIV OSAKA·Filed 2016·Granted May 15, 2018·0 cites·5 claims
- 1636US10073348B2Resist-pattern-forming method and chemically amplified resist materialUNIV OSAKA·Filed 2016·Granted Sep 11, 2018·0 cites·20 claims
- 1732US2017097570A1Resist patterning method, latent resist image forming device, and resist materialUNIV OSAKA·Filed 2015·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Seiichi Tagawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →