Inventor · disambiguated record
Shiran Cheng
Also filed as: CHENG SHIRAN
7 granted patents·7 pending applications·0 citations·filing 2019–2022
66Inventor score
Top patents by PatentIndex Score
14 records- 0153US12009188B2Rotatable faraday cleaning apparatus and plasma processing systemJIANGSU LEUVEN INSTR CO LTD·Filed 2020·Granted Jun 11, 2024·0 cites·6 claims
- 0249US12243713B2Anti-breakdown ion source discharge apparatusJIANGSU LEUVEN INSTR CO LTD·Filed 2021·Granted Mar 4, 2025·0 cites·10 claims
- 0349US11837439B2Inductively coupled plasma treatment systemJIANGSU LEUVEN INSTR CO LTD·Filed 2020·Granted Dec 5, 2023·0 cites·10 claims
- 0449US2025140512A1Ion beam etching machine and lower electrode structure thereofJIANGSU LEUVEN INSTR CO LTD·Filed 2022·Application pending·0 cites
- 0549US2023238218A1Separated gas inlet structure for blocking plasma backflowJIANGSU LEUVEN INSTR CO LTD·Filed 2021·Application pending·0 cites
- 0648US11955323B2Device for blocking plasma backflow in process chamber to protect air inlet structureJIANGSU LEUVEN INSTR CO LTD·Filed 2020·Granted Apr 9, 2024·0 cites·9 claims
- 0748US2023352267A1Dual-wall multi-structure quartz cylinder deviceJIANGSU LEUVEN INSTR CO LTD·Filed 2021·Application pending·0 cites
- 0847US2023326709A1Ion beam etching machine and lifting and rotating platform device thereofJIANGSU LEUVEN INSTR CO LTD·Filed 2021·Application pending·0 cites
- 0946US11735400B2Faraday cleaning device and plasma processing systemJIANGSU LEUVEN INSTR CO LTD·Filed 2020·Granted Aug 22, 2023·0 cites·6 claims
- 1046US2023207283A1Plasma etching system and faraday shielding apparatus which can be used for heatingBEIJING LEUVEN SEMICONDUCTOR TECH CO LTD·Filed 2021·Application pending·0 cites
- 1146US2023207284A1Plasma etching system and faraday shielding apparatus which can be used for heatingBEIJING LEUVEN SEMICONDUCTOR TECH CO LTD·Filed 2021·Application pending·0 cites
- 1244US12494346B2Ceramic air inlet radio frequency connection type cleaning deviceJIANGSU LEUVEN INSTR CO LTD·Filed 2020·Granted Dec 9, 2025·0 cites·7 claims
- 1344US2022319816A1Plasma etching systemJIANGSU LEUVEN INSTR CO LTD·Filed 2020·Application pending·0 cites
- 1441US12112923B2Reaction chamber liningJIANGSU LEUVEN INSTR CO LTD·Filed 2019·Granted Oct 8, 2024·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →