Inventor · disambiguated record
Sheng-Chen Chung
Also filed as: CHUNG SHENG-CHEN
44 granted patents·4 pending applications·314 citations·filing 2006–2025
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG17TAIWAN SEMICONDUCTOR MFG CO LTD9CHUNG SHENG-CHEN6CHUANG HARRY3UNITED MICROELECTRONICS CORP3
Top patents by PatentIndex Score
48 records- 0198US8105891B2Method for tuning a work function of high-K metal gate devicesYEH CHIUNG-HAN·Filed 2010·Granted Jan 31, 2012·124 cites·20 claims
- 0294US7898037B2Contact scheme for MOSFETsTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Mar 1, 2011·33 cites·13 claims
- 0392US8890260B2Polysilicon design for replacement gate technologyCHUANG HARRY HAK-LAY·Filed 2009·Granted Nov 18, 2014·14 cites·21 claims
- 0489US10985071B1Gate oxide forming processUNITED MICROELECTRONICS CORP·Filed 2019·Granted Apr 20, 2021·6 cites·14 claims
- 0589US8334572B2Resistive device for high-k metal gate technologyCHUNG SHENG-CHEN·Filed 2011·Granted Dec 18, 2012·9 cites·19 claims
- 0689US8093116B2Method for N/P patterning in a gate last processCHUNG SHENG-CHEN·Filed 2009·Granted Jan 10, 2012·17 cites·20 claims
- 0789US2025311354A1Polysilicon Design for Replacement Gate TechnologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0888US8058119B2Device scheme of HKMG gate-last processCHUNG SHENG-CHEN·Filed 2009·Granted Nov 15, 2011·13 cites·16 claims
- 0985US8546227B2Contact for high-K metal gate deviceCHUANG HAK-LAY·Filed 2011·Granted Oct 1, 2013·7 cites·13 claims
- 1084US8286114B23-dimensional device design layoutCHUANG HARRY·Filed 2007·Granted Oct 9, 2012·12 cites·20 claims
- 1184US7939392B2Method for gate height control in a gate last processTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted May 10, 2011·10 cites·20 claims
- 1283US8796084B2Method for removing hard masks on gates in semiconductor manufacturing processTSAI HUNG CHIH·Filed 2010·Granted Aug 5, 2014·9 cites·18 claims
- 1382US8525270B2Structures and methods to stop contact metal from extruding into replacement gatesTEO LEE-WEE·Filed 2010·Granted Sep 3, 2013·6 cites·20 claims
- 1481US10658492B2Polysilicon design for replacement gate technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 19, 2020·1 cites·20 claims
- 1581US7927943B2Method for tuning a work function of high-k metal gate devicesTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Apr 19, 2011·7 cites·20 claims
- 1679US10403736B2Polysilicon design for replacement gate technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 3, 2019·1 cites·20 claims
- 1779US10084061B2Polysilicon design for replacement gate technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 25, 2018·1 cites·20 claims
- 1878US9929251B2Polysilicon design for replacement gate technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Mar 27, 2018·1 cites·20 claims
- 1978US8368136B2Integrating a capacitor in a metal gate last processTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Feb 5, 2013·7 cites·20 claims
- 2077US12426333B2Polysilicon design for replacement gate technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 23, 2025·0 cites·20 claims
- 2176US7868361B2Semiconductor device with both I/O and core components and method of fabricating sameTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jan 11, 2011·4 cites·14 claims
- 2274US11018241B2Polysilicon design for replacement gate technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 25, 2021·0 cites·20 claims
- 2374US9093559B2Method of hybrid high-k/metal-gate stack fabricationNG JIN-AUN·Filed 2012·Granted Jul 28, 2015·4 cites·20 claims
- 2472US9679988B2Polysilicon design for replacement gate technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 13, 2017·1 cites·20 claims
- 2572US9209089B2Method of fabricating a metal gate semiconductor deviceCHUNG SHENG-CHEN·Filed 2012·Granted Dec 8, 2015·3 cites·19 claims
- 2669US8008145B2High-K metal gate structure fabrication method including hard maskTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Aug 30, 2011·3 cites·14 claims
- 2769US7678636B2Selective formation of stress memorization layerTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Mar 16, 2010·4 cites·12 claims
- 2868US8487382B2Device scheme of HKMG gate-last processCHUNG SHENG-CHEN·Filed 2011·Granted Jul 16, 2013·2 cites·20 claims
- 2967US8138554B2Semiconductor device with local interconnectsCHUANG HARRY·Filed 2008·Granted Mar 20, 2012·3 cites·11 claims
- 3066US7998830B2Semiconductor device with both I/O and core components and method of fabricating sameTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Aug 16, 2011·1 cites·20 claims
- 3166US7833848B2Method for removing hard masks on gates in semiconductor manufacturing processTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Nov 16, 2010·2 cites·13 claims
- 3266US7632729B2Method for semiconductor device performance enhancementTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Dec 15, 2009·3 cites·16 claims
- 3365US9349655B2Method for mechanical stress enhancement in semiconductor devicesDIAZ CARLOS H·Filed 2009·Granted May 24, 2016·4 cites·20 claims
- 3463US8853753B2Contact for high-k metal gate deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 7, 2014·1 cites·17 claims
- 3562US8372706B2Semiconductor device fabrication method including hard mask and sacrificial spacer elementsTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Feb 12, 2013·1 cites·20 claims
- 3655US8716103B2Semiconductor device and method of fabricating sameTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted May 6, 2014·0 cites·20 claims
- 3754US7812379B2SOI devicesTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Oct 12, 2010·0 cites·8 claims
- 3854US7803674B2Methods for fabricating SOI devicesTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Sep 28, 2010·0 cites·8 claims
- 3952US2010059823A1Resistive device for high-k metal gate technology and method of makingTAIWAN SEMICONDUCTOR MFG·Filed 2009·Application pending·0 cites
- 4050US7550795B2SOI devices and methods for fabricating the sameTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jun 23, 2009·0 cites·9 claims
- 4149US9620620B2Methods to stop contact metal from extruding into replacement gatesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 11, 2017·0 cites·20 claims
- 4247US2010117190A1Fuse structure for intergrated circuit devicesCHUANG HARRY·Filed 2008·Application pending·0 cites
- 4346US8461629B2Semiconductor device and method of fabricating sameCHENG CHUNG LONG·Filed 2011·Granted Jun 11, 2013·0 cites·17 claims
- 4445US11195905B2Metal-oxide-semiconductor transistor and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2019·Granted Dec 7, 2021·0 cites·18 claims
- 4538US9142414B2CMOS devices with metal gates and methods for forming the sameCHUNG SHENG-CHEN·Filed 2011·Granted Sep 22, 2015·0 cites·13 claims
- 4638US8329521B2Method and device with gate structure formed over the recessed top portion of the isolation structureCHUANG HARRY HAK-LAY·Filed 2010·Granted Dec 11, 2012·0 cites·20 claims
- 4737US2019103492A1Method for fabricating semiconductor device involving forming epitaxial materialUNITED MICROELECTRONICS CORP·Filed 2017·Application pending·0 cites
- 4828US9711415B2Device for high-K and metal gate stacksLIN JYUN-MING·Filed 2012·Granted Jul 18, 2017·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →