Inventor · disambiguated record
Shannon W. Dunn
Also filed as: DUNN SHANNON D · DUNN SHANNON W
12 granted patents·2 pending applications·48 citations·filing 2006–2012
86Inventor score
Top patents by PatentIndex Score
14 records- 0189US8764999B2Sidewall image transfer pitch doubling and inline critical dimension slimmingDUNN SHANNON W·Filed 2011·Granted Jul 1, 2014·18 cites·23 claims
- 0286US7432191B1Method of forming a dual damascene structure utilizing a developable anti-reflective coatingTOKYO ELECTRON LTD·Filed 2007·Granted Oct 7, 2008·18 cites·16 claims
- 0380US7767386B2Method of patterning an organic planarization layerTOKYO ELECTRON LTD·Filed 2007·Granted Aug 3, 2010·8 cites·20 claims
- 0476US8647817B2Vapor treatment process for pattern smoothing and inline critical dimension slimmingDUNN SHANNON W·Filed 2012·Granted Feb 11, 2014·3 cites·20 claims
- 0560US8940475B2Double patterning with inline critical dimension slimmingDUNN SHANNON W·Filed 2011·Granted Jan 27, 2015·1 cites·18 claims
- 0647US8389206B2High normality solution for removing freeze material in lithographic applicationsDUNN SHANNON W·Filed 2009·Granted Mar 5, 2013·0 cites·18 claims
- 0746US2007077843A1Fabric for coverings for architectural openings and method and apparatus for manufacturing sameHARKENRIDER GREGORY P·Filed 2006·Application pending·0 cites
- 0843US7932017B2Method of double patterning a thin film using a developable anti-reflective coating and a developable organic planarization layerTOKYO ELECTRON LTD·Filed 2007·Granted Apr 26, 2011·0 cites·22 claims
- 0943US7858293B2Method for double imaging a developable anti-reflective coatingTOKYO ELECTRON LTD·Filed 2006·Granted Dec 28, 2010·0 cites·15 claims
- 1043US7811747B2Method of patterning an anti-reflective coating by partial developingTOKYO ELECTRON LTD·Filed 2006·Granted Oct 12, 2010·0 cites·16 claims
- 1142US7883835B2Method for double patterning a thin filmTOKYO ELECTRON LTD·Filed 2006·Granted Feb 8, 2011·0 cites·29 claims
- 1242US7862985B2Method for double patterning a developable anti-reflective coatingTOKYO ELECTRON LTD·Filed 2006·Granted Jan 4, 2011·0 cites·15 claims
- 1341US2008073321A1Method of patterning an anti-reflective coating by partial etchingTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1438US8507190B2Method for preparing alignment mark for multiple patterningDUNN SHANNON W·Filed 2010·Granted Aug 13, 2013·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →