Inventor · disambiguated record
Shinichiro Hayasaka
Also filed as: HAYASAKA SHINICHIRO
6 granted patents·2 pending applications·38 citations·filing 2006–2021
78Inventor score
Top patents by PatentIndex Score
8 records- 0190US7896967B2Gas supply system, substrate processing apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2007·Granted Mar 1, 2011·22 cites·5 claims
- 0284US8790529B2Gas supply system, substrate processing apparatus and gas supply methodHAYASAKA SHINICHIRO·Filed 2011·Granted Jul 29, 2014·11 cites·3 claims
- 0380US9732909B2Gas supply methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 15, 2017·5 cites·4 claims
- 0448US8859046B2Substrate processing apparatus, control method adopted in substrate processing apparatus and programNAKAMURA HIROSHI·Filed 2011·Granted Oct 14, 2014·0 cites·12 claims
- 0548US2006176928A1Substrate processing apparatus, control method adopted in substrate processing apparatus and programTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 0641US2019304824A1Plasma processing apparatus and method of transferring workpieceTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 0739US11899476B2Method and apparatus for measuring gas flowTOKYO ELECTRON LTD·Filed 2021·Granted Feb 13, 2024·0 cites·9 claims
- 0839US10316835B2Method of determining output flow rate of gas output by flow rate controller of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 11, 2019·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →