Inventor · disambiguated record
Shuji Hirano
Also filed as: HIRANO SHUJI
51 granted patents·18 pending applications·112 citations·filing 2006–2023
97Inventor score
Top patents by PatentIndex Score
69 records- 0195US9291896B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·20 claims
- 0294US8822129B2Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic deviceIWATO KAORU·Filed 2012·Granted Sep 2, 2014·12 cites·18 claims
- 0393US9527809B2Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Dec 27, 2016·6 cites·12 claims
- 0492US8252877B2Polymerizable compound and polymer compound obtained by using the sameHIRANO SHUJI·Filed 2009·Granted Aug 28, 2012·11 cites·10 claims
- 0591US9291898B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·19 claims
- 0688US9291897B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·3 cites·11 claims
- 0787US9470980B2Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic deviceFUJIFILM CORP·Filed 2014·Granted Oct 18, 2016·5 cites·18 claims
- 0885US9170489B2Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic deviceFUJIFILM CORP·Filed 2014·Granted Oct 27, 2015·4 cites·54 claims
- 0984US9651863B2Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted May 16, 2017·2 cites·22 claims
- 1082US8617788B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameKATO TAKAYUKI·Filed 2010·Granted Dec 31, 2013·4 cites·13 claims
- 1180US9423690B2Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the sameFUJIFILM CORP·Filed 2015·Granted Aug 23, 2016·3 cites·14 claims
- 1279US8865389B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming patternHIRANO SHUJI·Filed 2011·Granted Oct 21, 2014·3 cites·18 claims
- 1378US8771916B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameHIRANO SHUJI·Filed 2009·Granted Jul 8, 2014·2 cites·21 claims
- 1477US11042094B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2018·Granted Jun 22, 2021·1 cites·10 claims
- 1577US8802349B2Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the compositionYOSHIDOME MASAHIRO·Filed 2010·Granted Aug 12, 2014·4 cites·14 claims
- 1676US11009791B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted May 18, 2021·1 cites·13 claims
- 1776US9223215B2Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2014·Granted Dec 29, 2015·2 cites·16 claims
- 1876US7498116B2Resist composition and pattern formation method using the sameFUJIFILM CORP·Filed 2008·Granted Mar 3, 2009·4 cites·19 claims
- 1973US11331900B2Lithographic printing plate precursor and method for producing lithographic printing plateFUJIFILM CORP·Filed 2019·Granted May 17, 2022·1 cites·13 claims
- 2072US9760003B2Pattern forming method and actinic-ray- or radiation-sensitive resin compositionIWATO KAORU·Filed 2011·Granted Sep 12, 2017·2 cites·36 claims
- 2171US9323153B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the sameFUJIFILM CORP·Filed 2014·Granted Apr 26, 2016·2 cites·17 claims
- 2270US9766547B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Sep 19, 2017·1 cites·11 claims
- 2369US8795944B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the compositionSAEGUSA HIROSHI·Filed 2009·Granted Aug 5, 2014·2 cites·28 claims
- 2468US10444627B2Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Oct 15, 2019·1 cites·19 claims
- 2568US10031419B2Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Jul 24, 2018·1 cites·18 claims
- 2668US9323150B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming patternFUJIFILM CORP·Filed 2014·Granted Apr 26, 2016·1 cites·22 claims
- 2768US7799506B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Sep 21, 2010·2 cites·11 claims
- 2867US7374860B2Positive resist composition and pattern forming method using the sameFUJI FILM CORP·Filed 2006·Granted May 20, 2008·9 cites·11 claims
- 2965US9052590B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTAKAHASHI HIDENORI·Filed 2010·Granted Jun 9, 2015·1 cites·14 claims
- 3058US8362170B2Polymerizable compound and polymer compound obtained by using the sameFUJIFILM CORP·Filed 2012·Granted Jan 29, 2013·0 cites·8 claims
- 3156US2024116546A1Straddle type monorail vehicle and assembly method thereofHITACHI LTD·Filed 2023·Application pending·0 cites
- 3255US7923196B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Apr 12, 2011·4 cites·17 claims
- 3353US11590751B2Lithographic printing plate precursor, method for producing lithographic printing plate, polymer particle, and compositionFUJIFILM CORP·Filed 2019·Granted Feb 28, 2023·0 cites·16 claims
- 3452US9188862B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the sameFUJIFILM CORP·Filed 2014·Granted Nov 17, 2015·0 cites·18 claims
- 3551US10928727B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturingFUJIFILM CORP·Filed 2017·Granted Feb 23, 2021·0 cites·13 claims
- 3651US2010152400A1Polymerizable compound, lactone-containing compound, method for manufacturing lactone-containing compound and polymer compound obtained by polymerizing the polymerizable compoundFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 3750US8182975B2Positive resist composition and pattern forming method using the sameHIRANO SHUJI·Filed 2008·Granted May 22, 2012·0 cites·21 claims
- 3848US8124310B2Positive resist composition and pattern forming method using the sameHIRANO SHUJI·Filed 2008·Granted Feb 28, 2012·0 cites·19 claims
- 3948US8043791B2Positive photosensitive composition, pattern forming method using the composition and resin for use in the compositionFUJIFILM CORP·Filed 2008·Granted Oct 25, 2011·0 cites·20 claims
- 4048US7592118B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Sep 22, 2009·2 cites·21 claims
- 4147US2008241752A1Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 4247US2020166839A1Lithographic printing plate precursor, resin composition for producing lithographic printing plate precursor, and method for producing lithographic printing plateFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 4347US2019276575A1Method for producing resin and method for producing actinic ray-sensitive or radiation-sensitive compositionFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 4446US10488755B2Pattern forming method, photo mask manufacturing method, and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Nov 26, 2019·0 cites·9 claims
- 4546US10423068B2Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Sep 24, 2019·0 cites·15 claims
- 4646US2014363758A1Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 4746US2019219922A1Resist composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 4845US2014030643A1Actinic-ray-or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive resin film therefrom and method of forming pattern using the compositionFUJIFILM CORP·Filed 2013·Application pending·0 cites
- 4944US2019187558A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 5043US10551739B2Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist compositionFUJIFILM CORP·Filed 2018·Granted Feb 4, 2020·0 cites·10 claims
Showing the top 50 of 69 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →