Inventor · disambiguated record
Shin Hirotsu
Also filed as: HIROTSU SHIN
10 granted patents·1 pending application·54 citations·filing 2006–2023
83Inventor score
Top patents by PatentIndex Score
11 records- 0196US10672589B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2019·Granted Jun 2, 2020·45 cites·19 claims
- 0293US11574798B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 7, 2023·3 cites·24 claims
- 0379US12437970B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Oct 7, 2025·0 cites·15 claims
- 0472US7465670B2Plasma etching method, plasma etching apparatus, control program and computer storage medium with enhanced selectivityTOKYO ELECTRON LTD·Filed 2006·Granted Dec 16, 2008·4 cites·12 claims
- 0565US11764034B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 19, 2023·0 cites·11 claims
- 0664US9418863B2Method for etching etching target layerTOKYO ELECTRON LTD·Filed 2015·Granted Aug 16, 2016·1 cites·10 claims
- 0764US9312105B2Method for etching insulation filmTOKYO ELECTRON LTD·Filed 2015·Granted Apr 12, 2016·1 cites·4 claims
- 0862US11830704B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2023·Granted Nov 28, 2023·0 cites·24 claims
- 0943US2008020584A1Method of manufacturing semiconductor device and plasma processing apparatusHIROTSU SHIN·Filed 2007·Application pending·0 cites
- 1041US7943523B2Plasma etching method and computer readable storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted May 17, 2011·0 cites·10 claims
- 1138US8097534B2Method for manufacturing semiconductor device and storage mediumOGAWA SHUHEI·Filed 2008·Granted Jan 17, 2012·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →