Inventor · disambiguated record
Shao-Hua Hsu
Also filed as: HSU SHAO-HUA
30 granted patents·14 pending applications·119 citations·filing 2009–2025
96Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD22UNITED MICROELECTRONICS CORP6HSU CHE-HUA4LIAO PO-JUI3KANG WENG POO2
Top patents by PatentIndex Score
44 records- 0197US10325912B2Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 18, 2019·19 cites·20 claims
- 0296US11329140B2Semiconductor device and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 10, 2022·4 cites·20 claims
- 0395US11996466B2Semiconductor device and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 28, 2024·2 cites·20 claims
- 0494US11502076B2Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 15, 2022·7 cites·20 claims
- 0594US11114549B2Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 7, 2021·9 cites·20 claims
- 0693US12237416B2Cut-fin isolation regions and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 25, 2025·2 cites·20 claims
- 0786US12132050B2Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 0886US8623555B2Electrode useable in electrochemical cell and method of making sameKANG WENG POO·Filed 2012·Granted Jan 7, 2014·16 cites·16 claims
- 0986US2024371869A1Semiconductor Structure Cutting Process and Structures Formed TherebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1085US8704294B2Semiconductor device having metal gate and manufacturing method thereofLIAO PO-JUI·Filed 2011·Granted Apr 22, 2014·7 cites·8 claims
- 1185US8574990B2Method of manufacturing semiconductor device having metal gateLIAO PO-JUI·Filed 2011·Granted Nov 5, 2013·9 cites·20 claims
- 1284US9384962B2Oxygen treatment of replacement work-function metals in CMOS transistor gatesHWANG GUANG-YAW·Filed 2011·Granted Jul 5, 2016·7 cites·22 claims
- 1383US8952451B2Semiconductor device having metal gate and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2013·Granted Feb 10, 2015·5 cites·8 claims
- 1483US8003461B1Method of fabricating efuse structure, resistor sturcture and transistor sturctureUNITED MICROELECTRONICS CORP·Filed 2010·Granted Aug 23, 2011·7 cites·17 claims
- 1582US2024379820A1Air spacer and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1681US11894370B2Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 6, 2024·0 cites·20 claims
- 1780US12107149B2Air spacer and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 1, 2024·0 cites·20 claims
- 1880US2025366054A1Profiles of gate structures in semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1979US12027608B2Semiconductor structure having dielectric structure extending into second cavity of semiconductor FinDO NOT USE—TAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 2, 2024·1 cites·20 claims
- 2078US10796943B2Manufacturing method of semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2018·Granted Oct 6, 2020·2 cites·12 claims
- 2177US8802524B2Method of manufacturing semiconductor device having metal gatesLIAO PO-JUI·Filed 2011·Granted Aug 12, 2014·5 cites·20 claims
- 2277US2024313091A1Semiconductor structure having dielectric structure extending into second cavity of semiconductor finTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2377US2024290869A1Semiconductor device and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2476US11652155B2Air spacer and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 16, 2023·0 cites·20 claims
- 2573US7816243B2Semiconductor device and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2009·Granted Oct 19, 2010·6 cites·17 claims
- 2671US2025203940A1Profiles Of Gate Structures In Semiconductor DevicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2770US11349014B2Air spacer and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 31, 2022·0 cites·20 claims
- 2870US8268712B2Method of forming metal gate structure and method of forming metal gate transistorHSU CHE-HUA·Filed 2010·Granted Sep 18, 2012·2 cites·20 claims
- 2968US11171236B2Cut-fin isolation regions and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 9, 2021·1 cites·20 claims
- 3067US8841181B2Method for fabricating semiconductor device and PMOS device fabricated by the methodCHOU YING-HUNG·Filed 2012·Granted Sep 23, 2014·4 cites·15 claims
- 3164US2025159924A1Cut-fin isolation regions and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3262US8232152B2Removing method of a hard maskHSU CHE-HUA·Filed 2010·Granted Jul 31, 2012·2 cites·8 claims
- 3361US2025385098A1Semiconductor device with metal gate structure and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3457US8709930B2Semiconductor processTSAI ZEN-JAY·Filed 2011·Granted Apr 29, 2014·2 cites·19 claims
- 3556US2014065299A1Electrode useable in electrochemical cell and method of making sameUNIV VANDERBILT·Filed 2013·Application pending·0 cites
- 3655US8999830B2Semiconductor device having metal gate and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2013·Granted Apr 7, 2015·0 cites·27 claims
- 3755US2024355906A1Sti loss mitigation by radical oxidation treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3852US8252515B2Method for removing photoresistCHIEN CHIN-CHENG·Filed 2009·Granted Aug 28, 2012·0 cites·13 claims
- 3950US8492259B2Method of forming metal gate structureHSU CHE-HUA·Filed 2012·Granted Jul 23, 2013·0 cites·18 claims
- 4050US2014339652A1Semiconductor device with oxygen-containing metal gatesUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 4147US2024047581A1Semiconductor structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 4238US8486842B2Method of selectively removing patterned hard maskHSU CHE-HUA·Filed 2010·Granted Jul 16, 2013·0 cites·16 claims
- 4337US2012142157A1Method of fabricating a semiconductor structureCHEN CHENG-GUO·Filed 2010·Application pending·0 cites
- 4428US2012236467A1Ultracapacitor, methods of manufacturing and applications of the sameKANG WENG POO·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →