Inventor · disambiguated record
Shota Ishibashi
Also filed as: ISHIBASHI SHOTA
11 granted patents·7 pending applications·5 citations·filing 2013–2023
79Inventor score
Top patents by PatentIndex Score
18 records- 0182US9761601B2Semiconductor memory device and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2015·Granted Sep 12, 2017·5 cites·9 claims
- 0268US12488970B2Film forming apparatus and method of controlling film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Dec 2, 2025·0 cites·4 claims
- 0361US12486565B2Sputtering apparatus and control methodTOKYO ELECTRON LTD·Filed 2022·Granted Dec 2, 2025·0 cites·2 claims
- 0460US11742190B2Sputtering apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·0 cites·12 claims
- 0559US2023175112A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0658US12014911B2Sputtering apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 18, 2024·0 cites·7 claims
- 0757US11851750B2Apparatus and method for performing sputtering processTOKYO ELECTRON LTD·Filed 2021·Granted Dec 26, 2023·0 cites·15 claims
- 0856US11705315B2Sputtering apparatus and sputtering methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 18, 2023·0 cites·10 claims
- 0954US2025174465A1Hard mask, substrate processing method, and removal method for hard maskTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1052US11715671B2Film forming system, magnetization characteristic measuring device, and film forming methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 1, 2023·0 cites·20 claims
- 1151US2024274436A1Film forming method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1249US12027353B2Substrate processing method and apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 2, 2024·0 cites·4 claims
- 1349US11776817B2Pattern forming methodTOKYO ELECTRON LTD·Filed 2021·Granted Oct 3, 2023·0 cites·17 claims
- 1449US2022081757A1Film forming apparatus, film forming system, and film forming methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1548US11479848B2Film forming apparatus and methodTOKYO ELECTRON LTD·Filed 2021·Granted Oct 25, 2022·0 cites·14 claims
- 1644US2020227273A1Hard mask and semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1739US2014021555A1Manufacturing method of semiconductor device and semiconductor deviceTOSHIBA KK·Filed 2013·Application pending·0 cites
- 1830US2016268282A1Semiconductor memory device and method for manufacturing sameTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →