Inventor · disambiguated record
Shigenori Ishihara
Also filed as: ISHIHARA SHIGENORI
14 granted patents·5 pending applications·213 citations·filing 2001–2018
89Inventor score
Top patents by PatentIndex Score
19 records- 0195US8298627B2Method and apparatus of plasma treatmentMINAMI TAKASHI·Filed 2011·Granted Oct 30, 2012·186 cites·3 claims
- 0283US9627187B2Sputtering apparatusCANON ANELVA CORP·Filed 2014·Granted Apr 18, 2017·6 cites·19 claims
- 0383US7579287B2Surface treatment method, manufacturing method of semiconductor device, and manufacturing method of capacitive elementCANON KK·Filed 2006·Granted Aug 25, 2009·10 cites·12 claims
- 0481US9175377B2Film forming apparatus and film forming methodISHIHARA SHIGENORI·Filed 2011·Granted Nov 3, 2015·4 cites·17 claims
- 0576US9997339B2Sputtering apparatus and substrate processing apparatusCANON ANELVA CORP·Filed 2015·Granted Jun 12, 2018·2 cites·9 claims
- 0675US9502223B2Sputtering apparatus, target and shieldCANON ANELVA CORP·Filed 2014·Granted Nov 22, 2016·1 cites·10 claims
- 0772US10062551B2Sputtering apparatus and substrate processing apparatusCANON ANELVA CORP·Filed 2015·Granted Aug 28, 2018·2 cites·16 claims
- 0867US10615012B2Sputtering apparatus and substrate processing apparatusCANON ANELVA CORP·Filed 2018·Granted Apr 7, 2020·0 cites·5 claims
- 0957US9470970B2Mask blank, transfer mask, and methods of manufacturing the sameHOYA CORP·Filed 2013·Granted Oct 18, 2016·0 cites·6 claims
- 1057US2015034481A1Fastening member and vacuum deviceCANON ANELVA CORP·Filed 2014·Application pending·0 cites
- 1156US9952498B2Mask blank, and transfer maskHOYA CORP·Filed 2016·Granted Apr 24, 2018·0 cites·7 claims
- 1254US7026077B2Photomask blank manufacturing methodHOYA CORP·Filed 2003·Granted Apr 11, 2006·1 cites·6 claims
- 1352US7601468B2Process for manufacturing half-tone phase shifting mask blanksHOYA CORP·Filed 2006·Granted Oct 13, 2009·0 cites·5 claims
- 1447US7141339B2Process for manufacturing half-tone phase shifting mask blanksHOYA CORP·Filed 2003·Granted Nov 28, 2006·1 cites·25 claims
- 1545US2010260947A1Method and apparatus of plasma treatmentCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 1638US2005136576A1Plasma treatment method and plasma treatment apparatusCANON KK·Filed 2004·Application pending·0 cites
- 1738US2005090078A1Processing apparatus and methodCANON KK·Filed 2004·Application pending·0 cites
- 1834US9966241B2Sputtering apparatusCANON ANELVA CORP·Filed 2015·Granted May 8, 2018·0 cites·17 claims
- 1933US2001027023A1Organic substance removing methods, methods of producing semiconductor device, and organic substance removing apparatusesFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →