Inventor · disambiguated record
Shinichiro Kawakami
Also filed as: KAWAKAMI SHINICHIRO
18 granted patents·11 pending applications·21 citations·filing 2009–2025
90Inventor score
Top patents by PatentIndex Score
29 records- 0193US12002676B2Method for forming mask pattern, storage medium, and apparatus for processing substrateTOKYO ELECTRON LTD·Filed 2022·Granted Jun 4, 2024·1 cites·19 claims
- 0292US2025379056A1Substrate processing systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0390US11508580B2Method for forming mask pattern, storage medium, and apparatus for processing substrateTOKYO ELECTRON LTD·Filed 2018·Granted Nov 22, 2022·4 cites·10 claims
- 0486US12476110B2Substrate processing moduleTOKYO ELECTRON LTD·Filed 2024·Granted Nov 18, 2025·0 cites·18 claims
- 0583US10139732B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Nov 27, 2018·4 cites·17 claims
- 0680US11604415B2Substrate processing method, substrate processing apparatus, and computer readable recording mediumTOKYO ELECTRON LTD·Filed 2019·Granted Mar 14, 2023·2 cites·19 claims
- 0780US10394125B2Coating and developing method and coating and developing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 27, 2019·3 cites·14 claims
- 0878US10732508B2Coating and developing method and coating and developing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Aug 4, 2020·2 cites·2 claims
- 0977US10656526B2Substrate treatment method and thermal treatment apparatusTOKYO ELECTRON LTD·Filed 2017·Granted May 19, 2020·2 cites·10 claims
- 1069US10025190B2Substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Jul 17, 2018·2 cites·12 claims
- 1161US12298668B2Heat treatment apparatus and heat treatment methodTOKYO ELECTRON LTD·Filed 2021·Granted May 13, 2025·0 cites·20 claims
- 1257US9097977B2Process sequence for reducing pattern roughness and deformityKAWAKAMI SHINICHIRO·Filed 2012·Granted Aug 4, 2015·1 cites·19 claims
- 1356US2014225216A1PhotodetectorFUJITSU LTD·Filed 2014·Application pending·0 cites
- 1456US2024347354A1Heat-treating method, heat-treating apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1556US2023393483A1Heat treatment apparatus, heat treatment method, and recording mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1654US2024248413A1Substrate treatment method and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1753US2024120217A1Substrate treatment method, substrate treatment apparatus, and computer storage mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1851US2024027923A1Substrate processing apparatus, substrate processing method, and recording mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1949US10603964B2Pneumatic tireBRIDGESTONE CORP·Filed 2014·Granted Mar 31, 2020·0 cites·6 claims
- 2047US8389206B2High normality solution for removing freeze material in lithographic applicationsDUNN SHANNON W·Filed 2009·Granted Mar 5, 2013·0 cites·18 claims
- 2146US11036140B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jun 15, 2021·0 cites·17 claims
- 2245US9810987B2Substrate treatment method, computer storage medium and substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Nov 7, 2017·0 cites·5 claims
- 2344US10955743B2Substrate processing apparatus, substrate processing method and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2019·Granted Mar 23, 2021·0 cites·3 claims
- 2444US2012104535A1PhotodetectorKAWAKAMI SHINICHIRO·Filed 2011·Application pending·0 cites
- 2543US2024234174A1Thermal treatment apparatus, thermal treatment method, and storage mediumTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2641US10101669B2Exposure apparatus, resist pattern forming method, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Oct 16, 2018·0 cites·22 claims
- 2741US2016159149A1Run-flat tireBRIDGESTONE CORP·Filed 2014·Application pending·0 cites
- 2837US2013040246A1Multiple chemical treatment process for reducing pattern defectTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 2934US9748100B2Substrate processing method, storage medium and substrate processing systemTOKYO ELECTRON LTD·Filed 2015·Granted Aug 29, 2017·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →