Inventor · disambiguated record
Shih-Chung Kon
Also filed as: KON SHIH-CHUNG
6 granted patents·6 pending applications·8 citations·filing 2008–2024
75Inventor score
Top patents by PatentIndex Score
12 records- 0181US12347650B2Substrate processing system including dual ion filter for downstream plasmaLAM RES CORP·Filed 2024·Granted Jul 1, 2025·0 cites·17 claims
- 0273US8211846B2Materials for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2008·Granted Jul 3, 2012·3 cites·19 claims
- 0373US8084406B2Apparatus for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2008·Granted Dec 27, 2011·3 cites·11 claims
- 0464US11967486B2Substrate processing system including dual ion filter for downstream plasmaLAM RES CORP·Filed 2020·Granted Apr 23, 2024·0 cites·15 claims
- 0559US8585825B2Acoustic assisted single wafer wet clean for semiconductor wafer processPENG GRANT·Filed 2008·Granted Nov 19, 2013·2 cites·18 claims
- 0654US8226775B2Methods for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2008·Granted Jul 24, 2012·0 cites·24 claims
- 0751US2012132234A1Apparatus for particle removal by single-phase and two-phase mediaMUI DAVID S L·Filed 2011·Application pending·0 cites
- 0849US2023298859A1Optimizing edge radical flux in a downstream plasma chamberLAM RES CORP·Filed 2021·Application pending·0 cites
- 0949US2014034096A1Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer ProcessLAM RES CORP·Filed 2013·Application pending·0 cites
- 1048US2023282450A1Remote plasma source showerhead assembly with aluminum fluoride plasma exposed surfaceLAM RES CORP·Filed 2021·Application pending·0 cites
- 1129US2018096879A1Spin chuck including edge ringLAM RES AG·Filed 2016·Application pending·0 cites
- 1228US2018040502A1Apparatus for processing wafer-shaped articlesLAM RES AG·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →