Inventor · disambiguated record
Shinichi Kurita
Also filed as: KURITA SHINICHI
132 granted patents·56 pending applications·3,577 citations·filing 1986–2024
99Inventor score
Files withAPPLIED MATERIALS INC102KURITA SHINICHI17NIKON CORP17WHITE JOHN M9HITACHI POWER SEMICONDUCTOR DEVICE LTD7
Top patents by PatentIndex Score
188 records- 0199USD784276SSusceptor assemblyAPPLIED MATERIALS INC·Filed 2013·Granted Apr 18, 2017·333 cites·1 claims
- 0298US8083853B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2004·Granted Dec 27, 2011·753 cites·106 claims
- 0397US6235634B1Modular substrate processing systemAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted May 22, 2001·420 cites·83 claims
- 0496US9382621B2Ground return for plasma processesCHOI SOO YOUNG·Filed 2010·Granted Jul 5, 2016·27 cites·33 claims
- 0596US9214340B2Apparatus and method of forming an indium gallium zinc oxide layerAPPLIED MATERIALS INC·Filed 2015·Granted Dec 15, 2015·313 cites·20 claims
- 0696US8206075B2Methods and apparatus for sealing a chamberWHITE JOHN M·Filed 2005·Granted Jun 26, 2012·64 cites·16 claims
- 0796US7665951B2Multiple slot load lock chamber and method of operationAPPLIED MATERIALS INC·Filed 2006·Granted Feb 23, 2010·53 cites·18 claims
- 0894US12362149B2Film stress control for plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2023·Granted Jul 15, 2025·1 cites·20 claims
- 0994US7845891B2Decoupled chamber bodyAPPLIED MATERIALS INC·Filed 2006·Granted Dec 7, 2010·29 cites·21 claims
- 1094US7611217B2Methods and systems for inkjet drop positioningAPPLIED MATERIALS INC·Filed 2005·Granted Nov 3, 2009·23 cites·12 claims
- 1194US7207766B2Load lock chamber for large area substrate processing systemAPPLIED MATERIALS INC·Filed 2004·Granted Apr 24, 2007·69 cites·33 claims
- 1294US6213704B1Method and apparatus for substrate transfer and processingAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Apr 10, 2001·144 cites·27 claims
- 1392US10079536B2Rectifier, alternator using same and power supply using sameHITACHI POWER SEMICONDUCTOR DEVICE LTD·Filed 2016·Granted Sep 18, 2018·8 cites·11 claims
- 1492US8616820B2Double dual slot load lock chamberKURITA SHINICHI·Filed 2007·Granted Dec 31, 2013·15 cites·17 claims
- 1591US10262837B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2015·Granted Apr 16, 2019·5 cites·14 claims
- 1691US8033772B2Transfer chamber for vacuum processing systemAPPLIED MATERIALS INC·Filed 2006·Granted Oct 11, 2011·15 cites·31 claims
- 1791US4770105APiping travelling apparatusHITACHI LTD·Filed 1986·Granted Sep 13, 1988·78 cites·3 claims
- 1890US8061949B2Multiple slot load lock chamber and method of operationKURITA SHINICHI·Filed 2010·Granted Nov 22, 2011·11 cites·13 claims
- 1990US7018517B2Transfer chamber for vacuum processing systemAPPLIED MATERIALS INC·Filed 2003·Granted Mar 28, 2006·39 cites·30 claims
- 2090US6746198B2Substrate transfer shuttleAPPLIED MATERIALS INC·Filed 2001·Granted Jun 8, 2004·42 cites·21 claims
- 2189US10697062B2Gas flow guide design for uniform flow distribution and efficient purgeAPPLIED MATERIALS INC·Filed 2018·Granted Jun 30, 2020·3 cites·19 claims
- 2289US8272830B2Scissor lift transfer robotKURITA SHINICHI·Filed 2008·Granted Sep 25, 2012·15 cites·13 claims
- 2389US6833717B1Electron beam test system with integrated substrate transfer moduleAPPLIED MATERIALS INC·Filed 2004·Granted Dec 21, 2004·35 cites·30 claims
- 2488US10487401B2Diffuser temperature controlAPPLIED MATERIALS INC·Filed 2016·Granted Nov 26, 2019·4 cites·13 claims
- 2588US9200368B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2011·Granted Dec 1, 2015·6 cites·95 claims
- 2688US9076991B2Mask management system and method for OLED encapsulationKURITA SHINICHI·Filed 2012·Granted Jul 7, 2015·4 cites·20 claims
- 2788US7784164B2Electronic device manufacturing chamber methodAPPLIED MATERIALS INC·Filed 2005·Granted Aug 31, 2010·12 cites·10 claims
- 2888US7469715B2Chamber isolation valve RF groundingAPPLIED MATERIALS INC·Filed 2005·Granted Dec 30, 2008·12 cites·37 claims
- 2988US7319335B2Configurable prober for TFT LCD array testingAPPLIED MATERIALS INC·Filed 2004·Granted Jan 15, 2008·38 cites·12 claims
- 3088US7105463B2Load lock chamber having two dual slot regionsAPPLIED MATERIALS INC·Filed 2001·Granted Sep 12, 2006·39 cites·25 claims
- 3188US6856858B2Shared sensors for detecting substrate position/presenceAPPLIED MATERIALS INC·Filed 2003·Granted Feb 15, 2005·39 cites·17 claims
- 3288US6517303B1Substrate transfer shuttleAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Feb 11, 2003·79 cites·38 claims
- 3388US6176668B1In-situ substrate transfer shuttleAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Jan 23, 2001·95 cites·7 claims
- 3487US11854771B2Film stress control for plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·1 cites·15 claims
- 3587US11094508B2Film stress control for plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·3 cites·20 claims
- 3687US7086638B2Methods and apparatus for sealing an opening of a processing chamberAPPLIED MATERIALS INC·Filed 2004·Granted Aug 8, 2006·34 cites·34 claims
- 3787US5862103AMagneto-optical recording method capable of determining optimum laser beam intensitiesNIKON CORP·Filed 1997·Granted Jan 19, 1999·47 cites·5 claims
- 3886US7976635B2Dual substrate loadlock process equipmentAPPLIED MATERIALS INC·Filed 2010·Granted Jul 12, 2011·5 cites·13 claims
- 3986US6949143B1Dual substrate loadlock process equipmentAPPLIED MATERIALS INC·Filed 1999·Granted Sep 27, 2005·57 cites·79 claims
- 4085US11012022B2Inverter device and electric motor device using sameHITACHI POWER SEMICONDUCTOR DEVICE LTD·Filed 2018·Granted May 18, 2021·2 cites·14 claims
- 4185US9677177B2Substrate support with quadrantsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 13, 2017·6 cites·19 claims
- 4285US7822324B2Load lock chamber with heater in tubeAPPLIED MATERIALS INC·Filed 2007·Granted Oct 26, 2010·10 cites·25 claims
- 4385US7499767B2Methods and apparatus for positioning a substrate relative to a support stageAPPLIED MATERIALS INC·Filed 2006·Granted Mar 3, 2009·10 cites·19 claims
- 4484US10312058B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·3 cites·20 claims
- 4584US9922854B2Vertical inline CVD systemKURITA SHINICHI·Filed 2011·Granted Mar 20, 2018·7 cites·10 claims
- 4684US9187827B2Substrate support with ceramic insulationAPPLIED MATERIALS INC·Filed 2013·Granted Nov 17, 2015·2 cites·11 claims
- 4783US6719851B1Lid assembly for opening a process chamber lid and uses thereforAPPLIED MATERIALS INC·Filed 2000·Granted Apr 13, 2004·29 cites·6 claims
- 4882US7746088B2In-line electron beam test systemAPPLIED MATERIALS INC·Filed 2009·Granted Jun 29, 2010·6 cites·20 claims
- 4982US4918283AMethod of and apparatus for conducting plasma weldingHITACHI LTD·Filed 1988·Granted Apr 17, 1990·31 cites·3 claims
- 5081US11022032B2EngineHONDA MOTOR CO LTD·Filed 2019·Granted Jun 1, 2021·1 cites·15 claims
Showing the top 50 of 188 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →