Inventor · disambiguated record
Shun-Li Lin
Also filed as: LIN SHUN-LI
12 granted patents·4 pending applications·100 citations·filing 2001–2006
89Inventor score
Files withMACRONIX INT CO LTD14
Top patents by PatentIndex Score
16 records- 0184US7586609B2Method for analyzing overlay errorsMACRONIX INT CO LTD·Filed 2005·Granted Sep 8, 2009·9 cites·11 claims
- 0282US7132334B2Methods of code programming a mask ROM deviceMACRONIX INT CO LTD·Filed 2003·Granted Nov 7, 2006·27 cites·25 claims
- 0377US6975974B2Overlay error model, sampling strategy and associated equipment for implementationMACRONIX INT CO LTD·Filed 2001·Granted Dec 13, 2005·26 cites·5 claims
- 0468US6563127B2Optical proximity correction with rectangular contactMACRONIX INT CO LTD·Filed 2001·Granted May 13, 2003·10 cites·11 claims
- 0567US6627388B2Method for reducing roughness of photoresist through cross-linking reaction of deposit and photoresistMACRONIX INT CO LTD·Filed 2001·Granted Sep 30, 2003·11 cites·12 claims
- 0664US6348384B1Method of using organic polymer as covering layer for device lightly doped drain structureMACRONIX INT CO LTD·Filed 2001·Granted Feb 19, 2002·10 cites·17 claims
- 0760US6660458B2Method of optical proximity correctionMACRONIX INT CO LTD·Filed 2001·Granted Dec 9, 2003·6 cites·21 claims
- 0845US7683487B2Structure applied to a photolithographic processMACRONIX INT CO LTD·Filed 2006·Granted Mar 23, 2010·0 cites·4 claims
- 0944US6960411B2Mask with extended mask clear-out window and method of dummy exposure using the sameMACRONIX INT CO LTD·Filed 2002·Granted Nov 1, 2005·1 cites·16 claims
- 1041US7157215B2Photoresist with adjustable polarized light reaction and photolithography process using the photoresistMACRONIX INT CO LTD·Filed 2004·Granted Jan 2, 2007·0 cites·16 claims
- 1136US7008870B2Structure applied to a photolithographic process and method for fabricating a semiconductor deviceMACRONIX INT CO LTD·Filed 2003·Granted Mar 7, 2006·0 cites·20 claims
- 1236US2003198898A1Method for manufacturing a semiconductor deviceFiled 2002·Application pending·0 cites
- 1336US2003022099A1Photoresist with adjustable polarized light reaction and photolithography process using the photoresistFiled 2001·Application pending·0 cites
- 1433US6576407B2Method of improving astigmatism of a photoresist layerMACRONIX INT CO LTD·Filed 2001·Granted Jun 10, 2003·0 cites·14 claims
- 1531US2005003617A1Template padding method for padding edges of holes on semiconductor masksMACRONIX INT CO LTD·Filed 2003·Application pending·0 cites
- 1631US2003129538A1Method for eliminating corner round profile of the RELACS processMACRONIX INT CO LTD·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →