Inventor · disambiguated record
Shimon Maeda
Also filed as: MAEDA SHIMON
11 granted patents·9 pending applications·63 citations·filing 2005–2013
88Inventor score
Top patents by PatentIndex Score
20 records- 0187US8151225B2Pattern layout designing method, semiconductor device manufacturing method, and computer program productMAEDA SHIMON·Filed 2009·Granted Apr 3, 2012·12 cites·15 claims
- 0283US8234596B2Pattern data creating method, pattern data creating program, and semiconductor device manufacturing methodOGAWA RYUJI·Filed 2009·Granted Jul 31, 2012·8 cites·15 claims
- 0383US7752595B2Method for verifying and correcting post-OPC pattern layoutTOSHIBA KK·Filed 2007·Granted Jul 6, 2010·13 cites·18 claims
- 0479US9023222B2Pattern forming methodTOSHIBA KK·Filed 2013·Granted May 5, 2015·4 cites·17 claims
- 0577US8195697B2Database creation method, database device and design data evaluation methodMAEDA SHIMON·Filed 2009·Granted Jun 5, 2012·9 cites·10 claims
- 0676US7917871B2Method and program for pattern data generation using a modification guideTOSHIBA KK·Filed 2008·Granted Mar 29, 2011·8 cites·16 claims
- 0771US8261214B2Pattern layout creation method, program product, and semiconductor device manufacturing methodMAEDA SHIMON·Filed 2009·Granted Sep 4, 2012·6 cites·9 claims
- 0864US9058996B2Method for generating mask data and method for manufacturing integrated circuit deviceTOSHIBA KK·Filed 2013·Granted Jun 16, 2015·1 cites·12 claims
- 0961US8785329B2Method for forming pattern and method for manufacturing semiconductor deviceMAEDA SHIMON·Filed 2012·Granted Jul 22, 2014·1 cites·20 claims
- 1057US7949967B2Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2008·Granted May 24, 2011·0 cites·8 claims
- 1156US7966580B2Process-model generation method, computer program product, and pattern correction methodTOSHIBA KK·Filed 2008·Granted Jun 21, 2011·1 cites·6 claims
- 1247US2009293038A1Method and correction apparatus for correcting process proximity effect and computer program productMAEDA SHIMON·Filed 2009·Application pending·0 cites
- 1347US2005251781A1Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting programKOTANI TOSHIYA·Filed 2005·Application pending·0 cites
- 1446US2010062549A1Pattern correcting method, method of manufacturing semiconductor device, and pattern correcting programMAEDA SHIMON·Filed 2009·Application pending·0 cites
- 1546US2009031262A1Mask pattern formation method, mask pattern formation apparatus, and lithography maskMAEDA SHIMON·Filed 2008·Application pending·0 cites
- 1643US2010067777A1Evaluation pattern generating method, computer program product, and pattern verifying methodKODERA KATSUYOSHI·Filed 2009·Application pending·0 cites
- 1741US2006285739A1Evaluation pattern generating method and computer program productMAEDA SHIMON·Filed 2006·Application pending·0 cites
- 1836US2012054697A1Light source shape calculation methodTAKAHATA KAZUHIRO·Filed 2011·Application pending·0 cites
- 1932US2011177457A1Mask pattern generating method, manufacturing method of semiconductor device, and computer program productMAEDA SHIMON·Filed 2011·Application pending·0 cites
- 2030US2012198396A1Method of optimizing semiconductor device manufacturing process, method of manufacturing semiconductor device, and non-transitory computer readable mediumKAJIWARA MASANARI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →