Inventor · disambiguated record
Shunko Magoshi
Also filed as: MAGOSHI SHUNKO
20 granted patents·4 pending applications·242 citations·filing 1998–2023
95Inventor score
Top patents by PatentIndex Score
24 records- 0187US6560768B2Circuit pattern design method, circuit pattern design system, and recording mediumTOSHIBA KK·Filed 2001·Granted May 6, 2003·28 cites·18 claims
- 0285US11742179B2Proximity effect correcting method, master plate manufacturing method, and drawing apparatusKIOXIA CORP·Filed 2021·Granted Aug 29, 2023·1 cites·12 claims
- 0385US6316163B1Pattern forming methodTOSHIBA KK·Filed 1998·Granted Nov 13, 2001·57 cites·29 claims
- 0479US7854604B2Semiconductor device fabrication method and pattern formation moldTOSHIBA KK·Filed 2008·Granted Dec 21, 2010·5 cites·4 claims
- 0577US6495841B1Charged beam drawing apparatusTOSHIBA KK·Filed 1999·Granted Dec 17, 2002·30 cites·8 claims
- 0675US6543044B2Method of extracting characters and computer-readable recording mediumTOSHIBA KK·Filed 2001·Granted Apr 1, 2003·11 cites·15 claims
- 0773US6718532B2Charged particle beam exposure system using aperture mask in semiconductor manufactureTOSHIBA KK·Filed 2002·Granted Apr 6, 2004·10 cites·5 claims
- 0872US7368736B2Charged beam exposure apparatus and method for manufacturing mask and semiconductor deviceTOSHIBA KK·Filed 2006·Granted May 6, 2008·4 cites·18 claims
- 0972US7079994B2Method and system for producing semiconductor devicesTOSHIBA KK·Filed 2001·Granted Jul 18, 2006·5 cites·5 claims
- 1071US6481004B2Circuit pattern design method, exposure method, charged-particle beam exposure systemTOSHIBA KK·Filed 2001·Granted Nov 12, 2002·9 cites·8 claims
- 1169US7102147B2Charged particle beam exposure method and method for producing charged particle beam exposure dataTOSHIBA KK·Filed 2002·Granted Sep 5, 2006·8 cites·33 claims
- 1268US5994030APattern-forming method and lithographic systemTOSHIBA KK·Filed 1998·Granted Nov 30, 1999·23 cites·10 claims
- 1365US8282868B2Semiconductor device fabrication method and pattern formation moldYONEDA IKUO·Filed 2010·Granted Oct 9, 2012·1 cites·9 claims
- 1465US7985958B2Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing programTOSHIBA KK·Filed 2005·Granted Jul 26, 2011·1 cites·5 claims
- 1564US6020107APattern forming method through combined electron beam and light exposure utilizing multiple heat stepsTOSHIBA KK·Filed 1998·Granted Feb 1, 2000·22 cites·19 claims
- 1661US6835942B2Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction moduleTOSHIBA KK·Filed 2003·Granted Dec 28, 2004·7 cites·22 claims
- 1758US6675368B2Apparatus for and method of preparing pattern data of electronic partTOSHIBA KK·Filed 2001·Granted Jan 6, 2004·7 cites·20 claims
- 1857US2024105420A1Data generation apparatus, data generation method, and computer-readable storage mediumKIOXIA CORP·Filed 2023·Application pending·0 cites
- 1952US6093931APattern-forming method and lithographic systemTOSHIBA KK·Filed 1999·Granted Jul 25, 2000·11 cites·13 claims
- 2052US2008293169A1Lithography evaluating method, semiconductor device manufacturing method and program mediumTOSHIBA KK·Filed 2008·Application pending·0 cites
- 2150US8206895B2Method for forming pattern and method for manufacturing semiconductor deviceYONEDA IKUO·Filed 2008·Granted Jun 26, 2012·0 cites·5 claims
- 2240US2005167661A1Lithography evaluating method, semiconductor device manufacturing method and program mediumFiled 2004·Application pending·0 cites
- 2336US2001028991A1Exposure pattern data generation apparatus associated with standard cell library and charged beam exposureTOSHIBA KK·Filed 2001·Application pending·0 cites
- 2435US6204511B1Electron beam image picturing method and image picturing deviceTOSHIBA KK·Filed 1998·Granted Mar 20, 2001·2 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →