Inventor · disambiguated record
Shigeru Matsuno
Also filed as: MATSUNO SHIGERU · YAMAMUKA MIKIO
30 granted patents·8 pending applications·449 citations·filing 1986–2023
97Inventor score
Files withMITSUBISHI ELECTRIC CORP26SHIMADZU CORP3OLYMPUS MEDICAL SYSTEMS CORP2FUJIKAWA MASAHIRO1KAWASHIMA TEXTILE MILLS1
Top patents by PatentIndex Score
38 records- 0194US7422198B2Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal methodSHIMADZU CORP·Filed 2006·Granted Sep 9, 2008·18 cites·6 claims
- 0287US6273957B1Vaporizing device for CVD source materials and CVD apparatus employing the sameMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Aug 14, 2001·28 cites·20 claims
- 0385US6470144B1Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured therebyMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Oct 22, 2002·66 cites·4 claims
- 0484US7731162B2Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal methodSHIMADZU CORP·Filed 2008·Granted Jun 8, 2010·4 cites·1 claims
- 0583US6638880B2Chemical vapor deposition apparatus and a method of manufacturing a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Oct 28, 2003·23 cites·3 claims
- 0682US5034372APlasma based method for production of superconductive oxide layersMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jul 23, 1991·53 cites·2 claims
- 0781US8138442B2Wire electric discharge machining method, semiconductor wafer manufacturing method, and solar battery cell manufacturing methodSATO TATSUSHI·Filed 2005·Granted Mar 20, 2012·5 cites·11 claims
- 0880US7163197B2Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal methodMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Jan 16, 2007·21 cites·9 claims
- 0978US6312526B1Chemical vapor deposition apparatus and a method of manufacturing a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Nov 6, 2001·45 cites·15 claims
- 1074US5555154ACVD Raw Material for oxide-system dielectric thin film and capacitor produced by CVD method using the CVD raw materialMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Sep 10, 1996·35 cites·10 claims
- 1174US5372850AMethod of manufacturing an oxide-system dielectric thin film using CVD methodMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Dec 13, 1994·39 cites·33 claims
- 1271US8039396B2Method for manufacturing photovoltaic deviceMITSUBISHI ELECTRIC CORP·Filed 2007·Granted Oct 18, 2011·2 cites·12 claims
- 1370US6212059B1Capacitor including barium strontium titanate filmMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Apr 3, 2001·10 cites·15 claims
- 1467US8652869B2Method for roughening substrate surface and method for manufacturing photovoltaic deviceNISHIMURA KUNIHIKO·Filed 2009·Granted Feb 18, 2014·3 cites·8 claims
- 1565US6643430B2Temperature control system for a gratingMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Nov 4, 2003·10 cites·15 claims
- 1664US6882760B2Polarization dispersion compensating apparatusMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Apr 19, 2005·10 cites·10 claims
- 1758US6231658B1Chemical vapor deposition source for depositing lead zirconate titanate filmMITSUBISHI ELECTRIC CORP·Filed 2000·Granted May 15, 2001·4 cites·5 claims
- 1855US7637482B2Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal methodSHIMADZU CORP·Filed 2008·Granted Dec 29, 2009·3 cites·3 claims
- 1954US7078330B2Metal electrode and bonding method using the metal electrodeMITSUBISHI ELECTRIC CORP·Filed 2004·Granted Jul 18, 2006·6 cites·1 claims
- 2054US6235649B1Method of forming high dielectric constant thin film and method of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1999·Granted May 22, 2001·16 cites·8 claims
- 2154US2023128229A1Endoscopic treatment toolOLYMPUS MEDICAL SYSTEMS CORP·Filed 2022·Application pending·0 cites
- 2253US6690860B2Method of manufacturing gratingMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Feb 10, 2004·4 cites·15 claims
- 2352US6810179B2Variable dispersion compensatorMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Oct 26, 2004·4 cites·14 claims
- 2452US6512297B2CVD source material for forming an electrode, and electrode and wiring film for capacitor formed therefromMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jan 28, 2003·13 cites·10 claims
- 2548US2008029027A1Plasma Cvd DeviceMITSUBISHI ELECTRIC CORP·Filed 2005·Application pending·0 cites
- 2648US2008038585A1Process for Film Production and Semiconductor Device Utilizing Film Produced by the ProcessMITSUBISHI ELECTRIC CORP·Filed 2005·Application pending·0 cites
- 2747US6063443ACVD method for forming oxide-system dielectric thin filmMITSUBISHI ELECTRIC CORP·Filed 1996·Granted May 16, 2000·10 cites·19 claims
- 2846US2006278831A1Infrared inspection apparatus, infrared inspecting method and manufacturing method of semiconductor waferMITSUBISHI ELECTRIC CORP·Filed 2006·Application pending·0 cites
- 2945US2013206210A1Solar battery module, photovoltaic apparatus, and manufacturing method of solar battery moduleNIINOBE DAISUKE·Filed 2010·Application pending·0 cites
- 3042US2001039923A1Vaporizing device for CVD source materials and CVD apparatus employing the sameFiled 2001·Application pending·0 cites
- 3141US6448191B2Method of forming high dielectric constant thin film and method of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Sep 10, 2002·0 cites·6 claims
- 3240USD1042830SEndoscopic forcepsOLYMPUS MEDICAL SYSTEMS CORP·Filed 2023·Granted Sep 17, 2024·0 cites·1 claims
- 3340US2012097239A1Method for roughening substrate surface, method for manufacturing photovoltaic device, and photovoltaic deviceSATO TAKEHIKO·Filed 2010·Application pending·0 cites
- 3439US4756693AApparatus to spread a sample of seat top materialKAWASHIMA TEXTILE MILLS·Filed 1986·Granted Jul 12, 1988·11 cites·8 claims
- 3537US6807322B2PMD compensating apparatus for controlling polarization controller based on detection of magnitude of waveform distortionMITSUBISHI ELECTRIC CORP·Filed 2003·Granted Oct 19, 2004·0 cites·20 claims
- 3637US6103002ACVD method for forming oxide-system dielectric thin filmMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Aug 15, 2000·4 cites·14 claims
- 3737US2012037224A1Solar battery cell and method of manufacturing the sameFUJIKAWA MASAHIRO·Filed 2010·Application pending·0 cites
- 3833US6236559B1CapacitorMITSUBISHI ELECTRIC CORP·Filed 1999·Granted May 22, 2001·2 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →