Inventor · disambiguated record
Shuji Moriya
Also filed as: MORIYA SHUJI
39 granted patents·8 pending applications·542 citations·filing 1992–2021
98Inventor score
Top patents by PatentIndex Score
47 records- 0193US5494522APlasma process system and methodTOKYO ELECTRON LTD·Filed 1994·Granted Feb 27, 1996·90 cites·6 claims
- 0291US9026011B2Image forming apparatusCANON KK·Filed 2013·Granted May 5, 2015·7 cites·11 claims
- 0391US7379693B2Developing apparatusCANON KK·Filed 2006·Granted May 27, 2008·14 cites·16 claims
- 0491US7251441B2Developing apparatus including magnetic field generating means, for use with a developer which includes a magnetic toner componentCANON KK·Filed 2005·Granted Jul 31, 2007·13 cites·9 claims
- 0585US6516166B2Image fixing apparatusCANON KK·Filed 2001·Granted Feb 4, 2003·25 cites·22 claims
- 0685US5441076AProcessing apparatus using gasTOKYO ELECTRON LTD·Filed 1994·Granted Aug 15, 1995·51 cites·21 claims
- 0784US6737666B1Apparatus and method for detecting an end point of a cleaning processNEC ELECTRONICS CORP·Filed 2000·Granted May 18, 2004·34 cites·8 claims
- 0883US5439026AProcessing apparatus and flow control arrangement thereforTOKYO ELECTRON LTD·Filed 1993·Granted Aug 8, 1995·81 cites·7 claims
- 0981US6738593B2Developing device with developer bearing member overlying developer containing chamberCANON KK·Filed 2002·Granted May 18, 2004·19 cites·4 claims
- 1080US10786837B2Method for cleaning chamber of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 29, 2020·3 cites·12 claims
- 1180US8381755B2Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the sameFUJIKIN KK·Filed 2012·Granted Feb 26, 2013·5 cites·2 claims
- 1280US8210022B2Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the sameMORIYA SHUJI·Filed 2008·Granted Jul 3, 2012·9 cites·7 claims
- 1378US7239831B2Image forming apparatus when a maximum developing bias voltage |V| max and surface potential Vd of a charged image bearing member satisfy: |V| max≦|Vd|CANON KK·Filed 2004·Granted Jul 3, 2007·16 cites·11 claims
- 1477US9236272B2Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2013·Granted Jan 12, 2016·3 cites·11 claims
- 1576US7440718B2Developing apparatus featuring image defect supressionCANON KK·Filed 2006·Granted Oct 21, 2008·5 cites·12 claims
- 1675US8434522B2Fluid control apparatusOKASE WATARU·Filed 2008·Granted May 7, 2013·9 cites·1 claims
- 1775US7682843B2Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication systemTOKYO ELECTRON LTD·Filed 2006·Granted Mar 23, 2010·5 cites·6 claims
- 1874US9150965B2Processing apparatusMORIYA SHUJI·Filed 2010·Granted Oct 6, 2015·1 cites·12 claims
- 1974US8104516B2Gas supply unit and gas supply systemMORIYA SHUJI·Filed 2006·Granted Jan 31, 2012·8 cites·8 claims
- 2072US9435470B2Pipe jointOKABE TSUNEYUKI·Filed 2012·Granted Sep 6, 2016·3 cites·6 claims
- 2172US9012331B2Etching method and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Apr 21, 2015·3 cites·13 claims
- 2272US7383003B2Developing apparatus for preventing ghost images and uneven image densityCANON KK·Filed 2006·Granted Jun 3, 2008·4 cites·12 claims
- 2371US6614004B2Heater including heat dissipation resistor on substrate and image heating apparatus equipped with the heaterCANON KK·Filed 2001·Granted Sep 2, 2003·12 cites·18 claims
- 2470US8019260B2Image forming apparatusCANON KK·Filed 2010·Granted Sep 13, 2011·1 cites·3 claims
- 2570US7734205B2Image forming apparatusCANON KK·Filed 2008·Granted Jun 8, 2010·3 cites·9 claims
- 2670US5578129AGas supplying head and load lock chamber of semiconductor processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Nov 26, 1996·37 cites·21 claims
- 2767US7862638B2Gas supply system for semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Jan 4, 2011·2 cites·6 claims
- 2866US7233758B2Developing apparatus featuring a developer carrying member with an elastic surface layerCANON KK·Filed 2004·Granted Jun 19, 2007·9 cites·19 claims
- 2964US9691630B2Etching methodTOKYO ELECTRON LTD·Filed 2014·Granted Jun 27, 2017·1 cites·20 claims
- 3064US8219329B2Thermal type mass flow meter, and thermal type mass flow control deviceEBI HIROYUKI·Filed 2007·Granted Jul 10, 2012·7 cites·9 claims
- 3161US6834613B1Plasma-resistant member and plasma treatment apparatus using the sameTOSHIBA CERAMICS CO·Filed 1999·Granted Dec 28, 2004·27 cites·14 claims
- 3261US6346425B1Vapor-phase processing method capable of eliminating particle formationTOKYO ELECTRON LTD·Filed 2000·Granted Feb 12, 2002·8 cites·10 claims
- 3359US8893743B2Flow rate controller and processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Nov 25, 2014·2 cites·4 claims
- 3458US7962076B2Image forming apparatusCANON KK·Filed 2006·Granted Jun 14, 2011·1 cites·5 claims
- 3553US9371946B2Pipe jointTOKYO ELECTRON LTD·Filed 2013·Granted Jun 21, 2016·0 cites·2 claims
- 3649US5421365AFlow control apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Jun 6, 1995·15 cites·11 claims
- 3747US10312101B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 4, 2019·0 cites·5 claims
- 3847US2009246542A1Plasma process apparatus, plasma process method, and object processed by the plasma process methodUNIV NAGOYA NAT UNIV CORP·Filed 2009·Application pending·0 cites
- 3947US2008295963A1Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 4046US2021313169A1Apparatuses for manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2021·Application pending·0 cites
- 4145US2014333067A1JointOKABE TSUNEYUKI·Filed 2012·Application pending·0 cites
- 4243US2008017105A1Substrate Processing DeviceTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 4343US2004112289A1Thin-film deposition apparatus and method for rapidly switching supply of source gasesTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 4442US5294280AGas measuring device and processing apparatus provided with the gas measuring deviceTOKYO ELECTRON LTD·Filed 1992·Granted Mar 15, 1994·9 cites·10 claims
- 4540US2013216263A1Image forming apparatusCANON KK·Filed 2013·Application pending·0 cites
- 4638US11761075B2Substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 19, 2023·0 cites·32 claims
- 4736US2002060360A1Integrated fluid supply apparatus, sealing device used there, and semiconductor manufacturing system using itFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →