Inventor · disambiguated record
Shigeru Moriyama
Also filed as: MORIYAMA SHIGERU
7 granted patents·5 pending applications·51 citations·filing 1986–2025
83Inventor score
Top patents by PatentIndex Score
12 records- 0170US2023352328A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0263US9146481B2Local exposure apparatus, local exposure method and storage mediumOTA YOSHIHARU·Filed 2011·Granted Sep 29, 2015·3 cites·20 claims
- 0362US2025180288A1Substrate processing apparatus, fluid supply system, and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0456US11742232B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Aug 29, 2023·0 cites·4 claims
- 0556US2024234172A9Substrate processing apparatus and fluid heating deviceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0655US2024242978A1Substrate processing apparatus and substrate processing apparatus maintenance methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0751US2025251048A1Fluid supply system, substrate processing apparatus, and fluid supply methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0847US6335612B2Battery charger and method of detecting a fully charged condition of a secondary batteryHITACHI KOKI KK·Filed 2000·Granted Jan 1, 2002·4 cites·9 claims
- 0945US6114839ABattery charging apparatus with error detectionHITACHI KOKI KK·Filed 1998·Granted Sep 5, 2000·20 cites·7 claims
- 1041US4914054AMethod of producing a semiconductor device provided with front and back surface electrodesTOSHIBA KK·Filed 1986·Granted Apr 3, 1990·11 cites·2 claims
- 1137US5081857ACold rolling method using cleaning brushes for at least the back up rollsNIPPON KOKAN KK·Filed 1990·Granted Jan 21, 1992·5 cites·9 claims
- 1231US5130261AMethod of rendering the impurity concentration of a semiconductor wafer uniformTOSHIBA KK·Filed 1990·Granted Jul 14, 1992·8 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →