Inventor · disambiguated record
Shunichi Nabeya
Also filed as: NABEYA SHUNICHI
11 granted patents·3 pending applications·8 citations·filing 2011–2024
81Inventor score
Top patents by PatentIndex Score
14 records- 0184US8642796B2Organoruthenium compound for chemical deposition and chemical deposition process using the organoruthenium compoundSAITO MASAYUKI·Filed 2011·Granted Feb 4, 2014·3 cites·4 claims
- 0282US9447495B2Chemical vapor deposition raw material containing organic nickel compound, and chemical vapor deposition method using the chemical vapor deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2013·Granted Sep 20, 2016·2 cites·3 claims
- 0377US8911827B2Chemical vapor deposition method using an organoplatinum compoundSUZUKI KAZUHARU·Filed 2012·Granted Dec 16, 2014·2 cites·10 claims
- 0474US2025059642A1Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method for ruthenium thin film or ruthenium compound thin filmTANAKA PRECIOUS METAL IND·Filed 2024·Application pending·0 cites
- 0564US10526698B2Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2019·Granted Jan 7, 2020·0 cites·2 claims
- 0664US10407450B2Heterogeneous polynuclear complex for use in the chemical deposition of composite metal or metal compound thin filmsTANAKA PRECIOUS METAL IND·Filed 2016·Granted Sep 10, 2019·1 cites·20 claims
- 0763US2024060176A1Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method for ruthenium thin film or ruthenium compound thin filmTANAKA PRECIOUS METAL IND·Filed 2022·Application pending·0 cites
- 0858US9382616B2Chemical vapor deposition raw material comprising organoplatinum compound, and chemical vapor deposition method using the chemical vapor deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2012·Granted Jul 5, 2016·0 cites·4 claims
- 0951US2018119274A1Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw materialTANAKA PRECIOUS METAL IND·Filed 2016·Application pending·0 cites
- 1045US9108997B2Method for recycling organic ruthenium compound for chemical vapor depositionTANAKA PRECIOUS METAL IND·Filed 2013·Granted Aug 18, 2015·0 cites·19 claims
- 1142US9805936B2Method for producing nickel thin film on a Si substrate by chemical vapor deposition method, and method for producing Ni silicide thin film on Si substrateTANAKA PRECIOUS METAL IND·Filed 2014·Granted Oct 31, 2017·0 cites·5 claims
- 1241US10465283B2Organoplatinum compound for use in the chemical deposition of platinum compound thin filmsTANAKA PRECIOUS METAL IND·Filed 2016·Granted Nov 5, 2019·0 cites·11 claims
- 1341US10077282B2Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical depositionTANAKA PRECIOUS METAL IND·Filed 2016·Granted Sep 18, 2018·0 cites·20 claims
- 1437US10131987B2Raw material for chemical deposition including organoruthenium compound, and chemical deposition method using the raw material for chemical depositionTANAKA PRECIOUS METAL IND·Filed 2015·Granted Nov 20, 2018·0 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →