Inventor · disambiguated record
Shuichi Nagamine
Also filed as: NAGAMINE SHUICHI
28 granted patents·1 pending application·576 citations·filing 2000–2013
97Inventor score
Top patents by PatentIndex Score
29 records- 0194US6514570B1Solution processing apparatus and methodTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·90 cites·20 claims
- 0290US6533864B1Solution processing apparatus and methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 18, 2003·53 cites·12 claims
- 0389US6715943B2Solution treatment method and solution treatment unitTOKYO ELECTRON LTD·Filed 2001·Granted Apr 6, 2004·47 cites·26 claims
- 0489US6602382B1Solution processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 5, 2003·49 cites·9 claims
- 0588US6332723B1Substrate processing apparatus and methodTOKYO ELECTRON LTD·Filed 2000·Granted Dec 25, 2001·51 cites·19 claims
- 0688US6267516B1Developing apparatus and developing nozzleTOKYO ELECTRON LTD·Filed 2000·Granted Jul 31, 2001·35 cites·20 claims
- 0787US9073103B2Liquid processing apparatus, liquid processing method, and recording medium having computer program for performing the same methodMORITA SATOSHI·Filed 2011·Granted Jul 7, 2015·10 cites·13 claims
- 0886US9355871B2Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cupHIGASHIJIMA JIRO·Filed 2012·Granted May 31, 2016·8 cites·8 claims
- 0986USD610176SCoater cupTOKYO ELECTRON LTD·Filed 2009·Granted Feb 16, 2010·37 cites·1 claims
- 1086US6384894B2Developing method and developing unitTOKYO ELECTRON LTD·Filed 2001·Granted May 7, 2002·36 cites·11 claims
- 1186US6364547B1Solution processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Apr 2, 2002·38 cites·21 claims
- 1283US9048269B2Substrate liquid treatment apparatus with lift pin plateHIGASHIJIMA JIRO·Filed 2011·Granted Jun 2, 2015·6 cites·14 claims
- 1383US6541376B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Apr 1, 2003·24 cites·11 claims
- 1481US6843259B2Solution treatment unitTOKYO ELECTRON LTD·Filed 2002·Granted Jan 18, 2005·26 cites·14 claims
- 1580US8869811B2Liquid processing apparatus and liquid processing methodOGATA NOBUHIRO·Filed 2010·Granted Oct 28, 2014·5 cites·14 claims
- 1680US8539906B2Substrate liquid processing apparatusOGATA NOBUHIRO·Filed 2011·Granted Sep 24, 2013·5 cites·7 claims
- 1779US6730599B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 4, 2004·18 cites·7 claims
- 1878US10700166B2Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jun 30, 2020·4 cites·10 claims
- 1976US6241402B1Developing apparatus and method thereofTOKYO ELECTRON LTD·Filed 2000·Granted Jun 5, 2001·19 cites·16 claims
- 2074US8881751B2Substrate liquid processing apparatus, method of controlling substrate liquid processing apparatus, and storage medium performing substrate liquid processing apparatus control method on substrate liquid processing apparatusOGATA NOBUHIRO·Filed 2011·Granted Nov 11, 2014·3 cites·11 claims
- 2174US7665918B2Developing apparatus, developing method and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Feb 23, 2010·4 cites·19 claims
- 2273US8840752B2Flow passage switching apparatus, processing apparatus, flow passage switching method, processing method and storage mediumOGATA NOBUHIRO·Filed 2011·Granted Sep 23, 2014·3 cites·6 claims
- 2364US9275881B2Liquid processing apparatus, liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2012·Granted Mar 1, 2016·1 cites·7 claims
- 2462US9266153B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2012·Granted Feb 23, 2016·1 cites·6 claims
- 2561US9484230B2Substrate liquid processing apparatusOGATA NOBUHIRO·Filed 2011·Granted Nov 1, 2016·1 cites·12 claims
- 2658US8671875B2Liquid processing apparatus, liquid processing method and storage mediumNAGAMINE SHUICHI·Filed 2009·Granted Mar 18, 2014·2 cites·7 claims
- 2743US9346084B2Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2012·Granted May 24, 2016·0 cites·13 claims
- 2839US9022045B2Substrate liquid cleaning apparatus with controlled liquid port ejection angleHIGASHIJIMA JIRO·Filed 2011·Granted May 5, 2015·0 cites·17 claims
- 2936US2001047753A1Treatment solution discharge apparatusTOKYO ELECTRON LTD·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →