Inventor · disambiguated record
Shin-Woo Nam
Also filed as: NAM SHIN-WOO
10 granted patents·6 pending applications·134 citations·filing 1999–2020
88Inventor score
Top patents by PatentIndex Score
16 records- 0191US11545340B2Apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the sameSEMES CO LTD·Filed 2020·Granted Jan 3, 2023·4 cites·20 claims
- 0288US6464794B1Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulatesSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Oct 15, 2002·75 cites·9 claims
- 0383US6437411B1Semiconductor device having chamfered silicide layer and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 20, 2002·31 cites·15 claims
- 0480US10867775B2Apparatus and method for treating substrateSEMES CO LTD·Filed 2017·Granted Dec 15, 2020·4 cites·9 claims
- 0568US6740550B2Methods of manufacturing semiconductor devices having chamfered silicide layers thereinSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted May 25, 2004·12 cites·12 claims
- 0665US6797109B2Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulatesSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Sep 28, 2004·7 cites·3 claims
- 0764US10563919B2Method, system, and apparatus for controlling a temperature of a substrate in a plasma processing chamberSEMES CO LTD·Filed 2017·Granted Feb 18, 2020·1 cites·17 claims
- 0852US2006278341A1Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulatesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 0951US2017103871A1Apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the sameSEMES CO LTD·Filed 2016·Application pending·0 cites
- 1041US2003000648A1Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulatesSAMSUNG ELECTRONICS CO LTD·Filed 2002·Application pending·0 cites
- 1141US2003013315A1Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulatesSAMSUNG ELECTRONICS CO LTD·Filed 2002·Application pending·0 cites
- 1240US11244847B2Substrate treating apparatus and substrate treating methodSEMES CO LTD·Filed 2018·Granted Feb 8, 2022·0 cites·7 claims
- 1340US10319566B2Apparatus for supplying power and apparatus for treating substrate including the sameSEMES CO LTD·Filed 2018·Granted Jun 11, 2019·0 cites·12 claims
- 1439US11195705B2Plasma generating unit and substrate treating apparatus comprising the sameSEMES CO LTD·Filed 2018·Granted Dec 7, 2021·0 cites·17 claims
- 1535US2018102238A1Substrate support unit, substrate treating apparatus including the same, and method for controlling the sameSEMES CO LTD·Filed 2017·Application pending·0 cites
- 1634US2017316920A1Apparatus and method for treating a substrateSEMES CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →