Inventor · disambiguated record
Shigeru Nobe
Also filed as: NOBE SHIGERU
14 granted patents·8 pending applications·26 citations·filing 2004–2016
87Inventor score
Top patents by PatentIndex Score
22 records- 0184US8617275B2Polishing agent and method for polishing substrate using the polishing agentHOSHI YOUSUKE·Filed 2009·Granted Dec 31, 2013·8 cites·20 claims
- 0278US8609541B2Polishing slurry for metal films and polishing methodTANAKA TAKAAKI·Filed 2008·Granted Dec 17, 2013·5 cites·20 claims
- 0374US10040971B2Polishing agent and method for polishing substrate using the polishing agentHITACHI CHEMICAL CO LTD·Filed 2016·Granted Aug 7, 2018·1 cites·17 claims
- 0466US7682701B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2005·Granted Mar 23, 2010·4 cites·21 claims
- 0564US9633848B2Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic deviceHITACHI CHEMICAL CO LTD·Filed 2013·Granted Apr 25, 2017·1 cites·20 claims
- 0659US7687590B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2005·Granted Mar 30, 2010·2 cites·39 claims
- 0756US9165777B2Polishing agent and method for polishing substrate using the polishing agentHITACHI CHEMICAL CO LTD·Filed 2013·Granted Oct 20, 2015·0 cites·18 claims
- 0853US2015361303A1Polishing agent and method for polishing substrate using the polishing agentHITACHI CHEMICAL CO LTD·Filed 2015·Application pending·0 cites
- 0953US2014065825A1Polishing slurry for cmp and polishing methodHITACHI CHEMICAL CO LTD·Filed 2013·Application pending·0 cites
- 1052US8901002B2Polishing slurry for metal films and polishing methodHITACHI CHEMICAL CO LTD·Filed 2013·Granted Dec 2, 2014·0 cites·20 claims
- 1151US7358300B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2004·Granted Apr 15, 2008·5 cites·13 claims
- 1251US2007117394A1Polishing slurry for CMP and polishing methodHITACHI CHEMICAL CO LTD·Filed 2006·Application pending·0 cites
- 1348US2017267895A9Polishing slurry for cmp and polishing methodHITACHI CHEMICAL CO LTD·Filed 2015·Application pending·0 cites
- 1446US9395626B2Photosensitive resin composition, method for manufacturing patterned cured film, and electronic componentHITACHI CHEMICAL CO LTD·Filed 2012·Granted Jul 19, 2016·0 cites·13 claims
- 1545US8821750B2Metal polishing slurry and polishing methodAMANOKURA JIN·Filed 2008·Granted Sep 2, 2014·0 cites·21 claims
- 1644US2009283715A1Polishing slurry for cmpNOBE SHIGERU·Filed 2007·Application pending·0 cites
- 1744US2009094901A1CMP Polishing Liquid and Polishing MethodHITACHI CHEMICAL CO LTD·Filed 2007·Application pending·0 cites
- 1841US2004253462A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmHITACHI CHEMICAL CO LTD·Filed 2004·Application pending·0 cites
- 1941US2006199021A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmNARITA TAKENORI·Filed 2006·Application pending·0 cites
- 2036US8836089B2Positive photosensitive resin composition, method of creating resist pattern, and electronic componentTANIMOTO AKITOSHI·Filed 2011·Granted Sep 16, 2014·0 cites·22 claims
- 2130US9022834B2Polishing solution for CMP and polishing method using the polishing solutionSATOU EIICHI·Filed 2011·Granted May 5, 2015·0 cites·22 claims
- 2229US8592317B2Polishing solution for CMP and polishing method using the polishing solutionSATOU EIICHI·Filed 2011·Granted Nov 26, 2013·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →