Inventor · disambiguated record

Sho Oikawa

Also filed as: OIKAWA SHO

4 granted patents·3 pending applications·2 citations·filing 2019–2025

57Inventor score

Technology areasH10P

Files withTOKYO ELECTRON LTD7

Top patents by PatentIndex Score

7 records

0183US11211229B2Processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 28, 2021·2 cites·5 claims
0253US2025210330A1Plasma processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
0352US2025201535A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
0446US11721595B2Processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 8, 2023·0 cites·8 claims
0545US11610766B2Target object processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 21, 2023·0 cites·16 claims
0645US11328934B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted May 10, 2022·0 cites·12 claims
0742US2020168468A1Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →