Inventor · disambiguated record
Shinji Okazaki
Also filed as: OKAZAKI SHINJI
47 granted patents·8 pending applications·1,306 citations·filing 1979–2020
98Inventor score
Top patents by PatentIndex Score
55 records- 0197US5512328AMethod for forming a pattern and forming a thin film used in pattern formationHITACHI LTD·Filed 1993·Granted Apr 30, 1996·336 cites·22 claims
- 0292US5334282AElectron beam lithography system and methodHITACHI LTD·Filed 1991·Granted Aug 2, 1994·78 cites·17 claims
- 0391US6889043B2Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control systemSONY CORP·Filed 2001·Granted May 3, 2005·55 cites·19 claims
- 0490US8989225B2Laser apparatusKAKIZAKI KOUJI·Filed 2012·Granted Mar 24, 2015·11 cites·23 claims
- 0590US7130631B2Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control systemSONY CORP·Filed 2005·Granted Oct 31, 2006·16 cites·1 claims
- 0688US5895741APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1997·Granted Apr 20, 1999·59 cites·27 claims
- 0788US5097138AElectron beam lithography system and methodHITACHI LTD·Filed 1990·Granted Mar 17, 1992·52 cites·7 claims
- 0887US5424173AElectron beam lithography system and methodHITACHI LTD·Filed 1993·Granted Jun 13, 1995·49 cites·18 claims
- 0987US4723903AStamper for replicating high-density data recording disksHITACHI LTD·Filed 1985·Granted Feb 9, 1988·61 cites·14 claims
- 1085US6987970B2Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control systemSONY CORP·Filed 2005·Granted Jan 17, 2006·8 cites·1 claims
- 1185US5402410AHigh density storage of information on a substrate with multiple depth and heightHITACHI LTD·Filed 1991·Granted Mar 28, 1995·37 cites·71 claims
- 1285US4798470APattern printing method and apparatusHITACHI LTD·Filed 1986·Granted Jan 17, 1989·37 cites·9 claims
- 1381US7884325B2Electron beam measurement apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Feb 8, 2011·6 cites·12 claims
- 1481US5700601APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1995·Granted Dec 23, 1997·40 cites·22 claims
- 1581US5305364AProjection type X-ray lithography apparatusHITACHI LTD·Filed 1992·Granted Apr 19, 1994·38 cites·19 claims
- 1680US7050573B2Method of generating ring tones using melody and communication terminal apparatusSONY CORP·Filed 2001·Granted May 23, 2006·27 cites·5 claims
- 1780US4729965AMethod of forming extrinsic base by diffusion from polysilicon/silicide source and emitter by lithographyHITACHI LTD·Filed 1985·Granted Mar 8, 1988·39 cites·24 claims
- 1879US5283440AElectron beam writing system used in a cell projection methodHITACHI LTD·Filed 1991·Granted Feb 1, 1994·34 cites·10 claims
- 1977US4315984AMethod of producing a semiconductor deviceHITACHI LTD·Filed 1980·Granted Feb 16, 1982·43 cites·5 claims
- 2074US7162240B2Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control systemSONY CORP·Filed 2005·Granted Jan 9, 2007·3 cites·6 claims
- 2174US7139572B2Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control systemSONY CORP·Filed 2005·Granted Nov 21, 2006·3 cites·1 claims
- 2274US5061599ARadiation sensitive materialsHITACHI LTD·Filed 1990·Granted Oct 29, 1991·26 cites·6 claims
- 2372US5621497APattern forming method and projection exposure tool thereforHITACHI LTD·Filed 1995·Granted Apr 15, 1997·33 cites·25 claims
- 2472US4403151AMethod of forming patternsHITACHI LTD·Filed 1981·Granted Sep 6, 1983·26 cites·12 claims
- 2571US5250812AElectron beam lithography using an aperture having an array of repeated unit patternsHITACHI LTD·Filed 1992·Granted Oct 5, 1993·25 cites·19 claims
- 2667US5691115AExposure method, aligner, and method of manufacturing semiconductor integrated circuit devicesHITACHI LTD·Filed 1995·Granted Nov 25, 1997·19 cites·15 claims
- 2766US4514556A4,4'-Methylene-bis-(2-ethyl-5-methyl imidazole) and methods of producing and using the sameSHIKOKU CHEM·Filed 1984·Granted Apr 30, 1985·5 cites·13 claims
- 2863US8064681B2Method and apparatus for inspecting reticleOKAI NOBUHIRO·Filed 2008·Granted Nov 22, 2011·5 cites·16 claims
- 2963US5757409AExposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatusHITACHI LTD·Filed 1996·Granted May 26, 1998·25 cites·43 claims
- 3061US6463652B1Apparatus and methods for manufacturing hot rolled steel sheetsISHIKAWAJIMA HARIMA HEAVY IND·Filed 1998·Granted Oct 15, 2002·21 cites·38 claims
- 3160US7337228B2Information processing method and apparatus and recording medium for controlling and simplifying a sign-up operation of an apparatus over a networkSONY CORP·Filed 2001·Granted Feb 26, 2008·6 cites·20 claims
- 3260US4983864AElectronic beam drawing apparatusHITACHI LTD·Filed 1989·Granted Jan 8, 1991·10 cites·5 claims
- 3359US2017272832A9Information processing system, information processing apparatus and method, recording medium, and programSATURN LICENSING LLC·Filed 2013·Application pending·0 cites
- 3456US6020109AExposure method, aligner, and method of manufacturing semiconductor integrated circuit devicesHITACHI LTD·Filed 1999·Granted Feb 1, 2000·11 cites·40 claims
- 3555US10512149B2Extreme UV light generation deviceGIGAPHOTON INC·Filed 2018·Granted Dec 17, 2019·0 cites·13 claims
- 3655US4307176AMethod of forming a patternHITACHI LTD·Filed 1979·Granted Dec 22, 1981·11 cites·12 claims
- 3753US10863613B2EUV light generatorGIGAPHOTON INC·Filed 2019·Granted Dec 8, 2020·0 cites·15 claims
- 3853US5557314AExposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatusHITACHI LTD·Filed 1993·Granted Sep 17, 1996·20 cites·17 claims
- 3951US9507248B2Two-beam interference apparatus and two-beam interference exposure systemGIGAPHOTON INC·Filed 2012·Granted Nov 29, 2016·0 cites·19 claims
- 4051US7943903B2Defect inspection method and its systemHITACHI HIGH TECH CORP·Filed 2009·Granted May 17, 2011·0 cites·15 claims
- 4150US11215558B2Nanostructure array, hydrogen detection element, and hydrogen detection deviceNAT UNIV CORP YOKOHAMA NAT UNIV·Filed 2020·Granted Jan 4, 2022·0 cites·7 claims
- 4250US5902705AExposure method, aligner, and method manufacturing semiconductor integrated circuit devicesHITACHI LTD·Filed 1997·Granted May 11, 1999·8 cites·30 claims
- 4350US2005034169A1Information processing system, information processing apparatus and method, recording medium, and programFiled 2004·Application pending·0 cites
- 4448US8575547B2Electron beam measurement apparatusSOHDA YASUNARI·Filed 2010·Granted Nov 5, 2013·0 cites·2 claims
- 4548US5334845ACharged beam exposure method and apparatus as well as aperture stop and production method thereofHITACHI LTD·Filed 1990·Granted Aug 2, 1994·8 cites·12 claims
- 4647US2005143128A1Communication cardFiled 2004·Application pending·0 cites
- 4747US2006206915A1Information processing system, information processing apparatus and method, recording medium, and programMAEDA SATORU·Filed 2006·Application pending·0 cites
- 4847US2006206917A1Information processing system, information processing apparatus and method, recording medium, and programMAEDA SATORU·Filed 2006·Application pending·0 cites
- 4947US2006206916A1Information processing system, information processing apparatus and method, recording medium, and programMAEDA SATORU·Filed 2006·Application pending·0 cites
- 5038US5932395AExposure method, aligner, and method manufacturing semiconductor integrated circuit devicesHITACHI LTD·Filed 1998·Granted Aug 3, 1999·3 cites·32 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →