Inventor · disambiguated record
Shigeyuki Okura
Also filed as: OKURA SHIGEYUKI
12 granted patents·4 pending applications·77 citations·filing 2005–2023
89Inventor score
Top patents by PatentIndex Score
16 records- 0188US7883076B2Semiconductor processing system and vaporizerTOKYO ELECTRON LTD·Filed 2006·Granted Feb 8, 2011·15 cites·20 claims
- 0287US7452424B2VaporizerTOKYO ELECTRON LTD·Filed 2005·Granted Nov 18, 2008·14 cites·20 claims
- 0386US7547003B2Vaporizing apparatus and semiconductor processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Jun 16, 2009·14 cites·20 claims
- 0484US8197600B2Vaporizer and semiconductor processing systemNAKAO KEN·Filed 2008·Granted Jun 12, 2012·6 cites·19 claims
- 0584US7343926B2Liquid raw material supply unit for vaporizerCKD CORP·Filed 2007·Granted Mar 18, 2008·10 cites·7 claims
- 0683US8371334B2Rotary switching valveCKD CORP·Filed 2010·Granted Feb 12, 2013·7 cites·10 claims
- 0780US9777377B2Film forming method and film forming deviceTOKYO ELECTRON LTD·Filed 2013·Granted Oct 3, 2017·2 cites·6 claims
- 0880US8382903B2Vaporizer and semiconductor processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Feb 26, 2013·5 cites·22 claims
- 0979US10767262B2Gas supply apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2017·Granted Sep 8, 2020·1 cites·5 claims
- 1078US10870920B2Gas supply device and valve deviceTOKYO ELECTRON LTD·Filed 2015·Granted Dec 22, 2020·3 cites·11 claims
- 1156US2011079179A1Liquid material vaporizer and film deposition apparatus using the sameTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1255US2021388493A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1354US2024052950A1Automatic pressure control device, film forming apparatus and pressure control methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1446US10584414B2Substrate processing method that includes step of introducing ballast gas to exhaust line while supplying processing gasTOKYO ELECTRON LTD·Filed 2018·Granted Mar 10, 2020·0 cites·3 claims
- 1545US2022396873A1Raw material gas supply system and raw material gas supply methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1644US10113235B2Source gas supply unit, film forming apparatus and source gas supply methodTOKYO ELECTRON LTD·Filed 2014·Granted Oct 30, 2018·0 cites·3 claims
Join the waitlist — get patent alerts
Get an alert when Shigeyuki Okura files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →