Inventor · disambiguated record
Shane R. Palmer
Also filed as: PALMER SHANE · PALMER SHANE R · PALMER SHANE ROY
20 granted patents·7 pending applications·448 citations·filing 1989–2018
94Inventor score
Files withTEXAS INSTRUMENTS INC10NIKON CORP9APPLIED MATERIALS INC2KUNJI EDMUND1NIKON RES CORPORATION OF AMERICA1
Top patents by PatentIndex Score
27 records- 0195US10310387B2Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scannerNIKON CORP·Filed 2018·Granted Jun 4, 2019·15 cites·17 claims
- 0295US10254654B2Microelectromechanical mirror assemblyNIKON CORP·Filed 2017·Granted Apr 9, 2019·6 cites·20 claims
- 0394US5539568AMethod of exposing a light sensitive materialTEXAS INSTRUMENTS INC·Filed 1995·Granted Jul 23, 1996·145 cites·6 claims
- 0493US5442184ASystem and method for semiconductor processing using polarized radiant energyTEXAS INSTRUMENTS INC·Filed 1993·Granted Aug 15, 1995·100 cites·23 claims
- 0592US6634018B2Optical proximity correctionTEXAS INSTRUMENTS INC·Filed 2001·Granted Oct 14, 2003·48 cites·15 claims
- 0686US5539567APhotolithographic technique and illuminator using real-time addressable phase shift light shiftTEXAS INSTRUMENTS INC·Filed 1994·Granted Jul 23, 1996·50 cites·19 claims
- 0783US6553558B2Integrated circuit layout and verification methodTEXAS INSTRUMENTS INC·Filed 2000·Granted Apr 22, 2003·22 cites·14 claims
- 0881US9690198B2Increasing and controlling sensitivity of non-linear metallic thin-film resistsNIKON CORP·Filed 2015·Granted Jun 27, 2017·2 cites·18 claims
- 0979US7735056B2Automated circuit design dimension change responsive to low contrast condition determination in photomask phase patternTEXAS INSTRUMENTS INC·Filed 2006·Granted Jun 8, 2010·5 cites·27 claims
- 1079US5306584AMask or wafer writing techniqueTEXAS INSTRUMENTS INC·Filed 1991·Granted Apr 26, 1994·35 cites·21 claims
- 1161US2018267425A1Method for improved cd control on 2-phase digital scanner with no loss to image fidelityNIKON CORP·Filed 2018·Application pending·0 cites
- 1260US9874817B2Microelectromechanical mirror assemblyNIPPON KOGAKU KK·Filed 2014·Granted Jan 23, 2018·0 cites·30 claims
- 1359US6342420B1Hexagonally symmetric integrated circuit cellTEXAS INSTRUMENTS INC·Filed 2000·Granted Jan 29, 2002·13 cites·8 claims
- 1457US11086231B2Array description system for large patternsNIKON CORP·Filed 2018·Granted Aug 10, 2021·0 cites·18 claims
- 1555US10416562B2Increasing and controlling sensitivity of non-linear metallic thin-film resistsNIKON RES CORPORATION OF AMERICA·Filed 2017·Granted Sep 17, 2019·0 cites·21 claims
- 1655US2014199844A1Array description system for large patternsNIKON CORP·Filed 2014·Application pending·0 cites
- 1753US8305559B2Exposure apparatus that utilizes multiple masksWILLIAMSON DAVID M·Filed 2009·Granted Nov 6, 2012·0 cites·32 claims
- 1849US2015227075A1Method for improved cd control on 2-phase digital scanner with no loss to image fidelityNIKON CORP·Filed 2015·Application pending·0 cites
- 1947US2015234295A1Dynamic patterning method that removes phase conflicts and improves pattern fidelity and cdu on a two phase-pixelated digital scannerNIKON CORP·Filed 2015·Application pending·0 cites
- 2046US2009111056A1Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniquesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2146US2009117491A1Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniquesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2244US2008305409A1Lithographic mask and method for printing features using the maskPALMER SHANE R·Filed 2007·Application pending·0 cites
- 2343US10840103B2Forced grid method for correcting mask patterns for a pattern transfer apparatusNIKON CORP·Filed 2016·Granted Nov 17, 2020·0 cites·66 claims
- 2441US8588508B2Method or matching high-numerical aperture scannersPALMER SHANE ROY·Filed 2011·Granted Nov 19, 2013·0 cites·14 claims
- 2535US6166408AHexagonally symmetric integrated circuit cellTEXAS INSTRUMENTS INC·Filed 1998·Granted Dec 26, 2000·3 cites·17 claims
- 2632US4973381AMethod and apparatus for etching surface with excited gasTEXAS INSTRUMENTS INC·Filed 1989·Granted Nov 27, 1990·4 cites·33 claims
- 2728US8507262B2Apparatus and method for monitoring culturesKUNJI EDMUND·Filed 2007·Granted Aug 13, 2013·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →