Inventor · disambiguated record
Shamouil Shamouilian
Also filed as: SHAMOUILIAN SHAMOUIL
68 granted patents·5 pending applications·6,399 citations·filing 1989–2006
99Inventor score
Top patents by PatentIndex Score
73 records- 0199US6863019B2Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gasAPPLIED MATERIALS INC·Filed 2002·Granted Mar 8, 2005·608 cites·6 claims
- 0298US6869880B2In situ application of etch back for improved deposition into high-aspect-ratio featuresAPPLIED MATERIALS INC·Filed 2002·Granted Mar 22, 2005·241 cites·13 claims
- 0398US6418874B1Toroidal plasma source for plasma processingAPPLIED MATERIALS INC·Filed 2000·Granted Jul 16, 2002·272 cites·19 claims
- 0498US6280584B1Compliant bond structure for joining ceramic to metalAPPLIED MATERIALS INC·Filed 1998·Granted Aug 28, 2001·167 cites·64 claims
- 0598US6095084AHigh density plasma process chamberAPPLIED MATERIALS INC·Filed 1997·Granted Aug 1, 2000·250 cites·86 claims
- 0697US6755150B2Multi-core transformer plasma sourceAPPLIED MATERIALS INC·Filed 2001·Granted Jun 29, 2004·79 cites·10 claims
- 0797US6367412B1Porous ceramic liner for a plasma sourceAPPLIED MATERIALS INC·Filed 2000·Granted Apr 9, 2002·135 cites·20 claims
- 0897US6310755B1Electrostatic chuck having gas cavity and methodAPPLIED MATERIALS INC·Filed 1999·Granted Oct 30, 2001·325 cites·38 claims
- 0997US6108189AElectrostatic chuck having improved gas conduitsAPPLIED MATERIALS INC·Filed 1997·Granted Aug 22, 2000·255 cites·64 claims
- 1097US5592358AElectrostatic chuck for magnetic flux processingAPPLIED MATERIALS INC·Filed 1994·Granted Jan 7, 1997·307 cites·28 claims
- 1197US5533923AChemical-mechanical polishing pad providing polishing unformityAPPLIED MATERIALS INC·Filed 1995·Granted Jul 9, 1996·175 cites·43 claims
- 1296US6721162B2Electrostatic chuck having composite dielectric layer and method of manufactureAPPLIED MATERIALS INC·Filed 2002·Granted Apr 13, 2004·76 cites·20 claims
- 1396US6538872B1Electrostatic chuck having heater and methodAPPLIED MATERIALS INC·Filed 2001·Granted Mar 25, 2003·123 cites·18 claims
- 1496US6478924B1Plasma chamber support having dual electrodesAPPLIED MATERIALS INC·Filed 2000·Granted Nov 12, 2002·124 cites·42 claims
- 1595US6481886B1Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Nov 19, 2002·92 cites·24 claims
- 1695US6468490B1Abatement of fluorine gas from effluentAPPLIED MATERIALS INC·Filed 2000·Granted Oct 22, 2002·78 cites·36 claims
- 1795US5996218AMethod of forming an electrostatic chuck suitable for magnetic flux processingAPPLIED MATERIALS INC·Filed 1996·Granted Dec 7, 1999·160 cites·22 claims
- 1895US5745331AElectrostatic chuck with conformal insulator filmAPPLIED MATERIALS INC·Filed 1995·Granted Apr 28, 1998·166 cites·42 claims
- 1994US6490146B2Electrostatic chuck bonded to base with a bond layer and methodAPPLIED MATERIALS INC·Filed 2001·Granted Dec 3, 2002·88 cites·28 claims
- 2094US6414834B1Dielectric covered electrostatic chuckAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·56 cites·34 claims
- 2194US6185839B1Semiconductor process chamber having improved gas distributorAPPLIED MATERIALS INC·Filed 1998·Granted Feb 13, 2001·83 cites·44 claims
- 2294US5880924AElectrostatic chuck capable of rapidly dechucking a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Mar 9, 1999·159 cites·32 claims
- 2393US7363876B2Multi-core transformer plasma sourceAPPLIED MATERIALS INC·Filed 2004·Granted Apr 29, 2008·37 cites·8 claims
- 2493US6581275B2Fabricating an electrostatic chuck having plasma resistant gas conduitsAPPLIED MATERIALS INC·Filed 2001·Granted Jun 24, 2003·74 cites·20 claims
- 2593US6503368B1Substrate support having bonded sections and methodAPPLIED MATERIALS INC·Filed 2000·Granted Jan 7, 2003·76 cites·22 claims
- 2693US6494958B1Plasma chamber support with coupled electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Dec 17, 2002·74 cites·20 claims
- 2793US6391146B1Erosion resistant gas energizerAPPLIED MATERIALS INC·Filed 2000·Granted May 21, 2002·73 cites·50 claims
- 2891US6730175B2Ceramic substrate supportAPPLIED MATERIALS INC·Filed 2002·Granted May 4, 2004·76 cites·30 claims
- 2991US6583980B1Substrate support tolerant to thermal expansion stressesAPPLIED MATERIALS INC·Filed 2000·Granted Jun 24, 2003·60 cites·44 claims
- 3091US6320736B1Chuck having pressurized zones of heat transfer gasAPPLIED MATERIALS INC·Filed 1999·Granted Nov 20, 2001·122 cites·37 claims
- 3190US6682627B2Process chamber having a corrosion-resistant wall and methodAPPLIED MATERIALS INC·Filed 2001·Granted Jan 27, 2004·37 cites·32 claims
- 3289US6440221B2Process chamber having improved temperature controlAPPLIED MATERIALS INC·Filed 1998·Granted Aug 27, 2002·93 cites·40 claims
- 3388US6689252B1Abatement of hazardous gases in effluentAPPLIED MATERIALS INC·Filed 1999·Granted Feb 10, 2004·80 cites·89 claims
- 3488US6449871B1Semiconductor process chamber having improved gas distributorAPPLIED MATERIALS INC·Filed 2000·Granted Sep 17, 2002·26 cites·37 claims
- 3588US6094334APolymer chuck with heater and method of manufactureAPPLIED MATERIALS INC·Filed 1999·Granted Jul 25, 2000·97 cites·58 claims
- 3688US5753132AMethod of making electrostatic chuck with conformal insulator filmAPPLIED MATERIALS INC·Filed 1996·Granted May 19, 1998·78 cites·34 claims
- 3787US6673323B1Treatment of hazardous gases in effluentAPPLIED MATERIALS INC·Filed 2000·Granted Jan 6, 2004·47 cites·26 claims
- 3887US6055150AMulti-electrode electrostatic chuck having fuses in hollow cavitiesAPPLIED MATERIALS INC·Filed 1998·Granted Apr 25, 2000·101 cites·32 claims
- 3986US5822171AElectrostatic chuck with improved erosion resistanceAPPLIED MATERIALS INC·Filed 1995·Granted Oct 13, 1998·74 cites·41 claims
- 4086US5486975ACorrosion resistant electrostatic chuckAPPLIED MATERIALS INC·Filed 1994·Granted Jan 23, 1996·116 cites·24 claims
- 4185US6726804B2RF power delivery for plasma processing using modulated power signalFiled 2001·Granted Apr 27, 2004·22 cites·7 claims
- 4285US6151203AConnectors for an electrostatic chuck and combination thereofAPPLIED MATERIALS INC·Filed 1998·Granted Nov 21, 2000·76 cites·20 claims
- 4383US6462928B1Electrostatic chuck having improved electrical connector and methodAPPLIED MATERIALS INC·Filed 1999·Granted Oct 8, 2002·65 cites·13 claims
- 4482US6639783B1Multi-layer ceramic electrostatic chuck with integrated channelAPPLIED MATERIALS INC·Filed 1998·Granted Oct 28, 2003·46 cites·19 claims
- 4582US6023405AElectrostatic chuck with improved erosion resistanceAPPLIED MATERIALS INC·Filed 1998·Granted Feb 8, 2000·56 cites·42 claims
- 4682US5883778AElectrostatic chuck with fluid flow regulatorAPPLIED MATERIALS INC·Filed 1995·Granted Mar 16, 1999·68 cites·25 claims
- 4782US5729423APuncture resistant electrostatic chuckAPPLIED MATERIALS INC·Filed 1996·Granted Mar 17, 1998·57 cites·45 claims
- 4881US6712020B2Toroidal plasma source for plasma processingAPPLIED MATERIALS INC·Filed 2002·Granted Mar 30, 2004·15 cites·9 claims
- 4981US6490144B1Support for supporting a substrate in a process chamberAPPLIED MATERIALS INC·Filed 1999·Granted Dec 3, 2002·57 cites·65 claims
- 5079US6557248B1Method of fabricating an electrostatic chuckAPPLIED MATERIALS INC·Filed 1998·Granted May 6, 2003·47 cites·9 claims
Showing the top 50 of 73 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →