Inventor · disambiguated record
Shouqian Shao
Also filed as: SHAO SHOUQIAN
18 granted patents·10 pending applications·493 citations·filing 2001–2022
93Inventor score
Top patents by PatentIndex Score
28 records- 0198US8821985B2Method and apparatus for high-K gate performance improvement and combinatorial processingINTERMOLECULAR INC·Filed 2012·Granted Sep 2, 2014·342 cites·12 claims
- 0295US6872909B2Toroidal low-field reactive gas and plasma source having a dielectric vacuum vesselAPPLIED SCIENCE & TECH INC·Filed 2003·Granted Mar 29, 2005·55 cites·10 claims
- 0393US7501600B2Toroidal low-field reactive gas and plasma source having a dielectric vacuum vesselMKS INSTR INC·Filed 2005·Granted Mar 10, 2009·17 cites·25 claims
- 0493US6437290B1Heat treatment apparatus having a thin light-transmitting windowTOKYO ELECTRON LTD·Filed 2001·Granted Aug 20, 2002·48 cites·30 claims
- 0590US8613863B2Methods for selective etching of a multi-layer substrateTONG JINHONG·Filed 2011·Granted Dec 24, 2013·14 cites·7 claims
- 0689US10697062B2Gas flow guide design for uniform flow distribution and efficient purgeAPPLIED MATERIALS INC·Filed 2018·Granted Jun 30, 2020·3 cites·19 claims
- 0787US8733280B2Showerhead for processing chamberYAP LIPYEOW·Filed 2010·Granted May 27, 2014·6 cites·15 claims
- 0882US8974649B2Combinatorial RF bias method for PVDSHAO SHOUQIAN·Filed 2011·Granted Mar 10, 2015·3 cites·17 claims
- 0972US12394595B2Multi-antenna unit for large area inductively coupled plasma processing apparatusAPPLIED MATERIALS INC·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 1071US9330928B2Methods for selective etching of a multi-layer substrateINTERMOLECULAR INC·Filed 2013·Granted May 3, 2016·2 cites·12 claims
- 1171US7914603B2Particle trap for a plasma sourceMKS INSTR INC·Filed 2008·Granted Mar 29, 2011·2 cites·56 claims
- 1266US12080516B2High density plasma enhanced process chamberAPPLIED MATERIALS INC·Filed 2021·Granted Sep 3, 2024·0 cites·22 claims
- 1365US9023438B2Methods and apparatus for combinatorial PECVD or PEALDINTERMOLECULAR INC·Filed 2012·Granted May 5, 2015·0 cites·20 claims
- 1458US2015184298A1Methods and Apparatus for Combinatorial PECVD or PEALDINTERMOLECULAR INC·Filed 2015·Application pending·0 cites
- 1557US11929236B2Methods of tuning to improve plasma stabilityAPPLIED MATERIALS INC·Filed 2019·Granted Mar 12, 2024·0 cites·20 claims
- 1655US8925481B2Systems and methods for measuring, monitoring and controlling ozone concentrationSHAO SHOUQIAN·Filed 2011·Granted Jan 6, 2015·1 cites·15 claims
- 1753US11967516B2Substrate support for chucking of mask for deposition processesAPPLIED MATERIALS INC·Filed 2020·Granted Apr 23, 2024·0 cites·20 claims
- 1852US2014183036A1In Situ Sputtering Target MeasurementINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 1951US2014134849A1Combinatorial Site Isolated Plasma Assisted DepositionINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2049US8851010B2Systems and methods for measuring, monitoring and controlling ozone concentrationSHAO SHOUQIAN·Filed 2011·Granted Oct 7, 2014·0 cites·12 claims
- 2149US2019382891A1Method and solution for resolving cgt mura issueAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2249US2014124359A1New Magnet Design Which Improves Erosion Profile for PVD SystemsINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2346US2013168231A1Method For Sputter Deposition And RF Plasma Sputter Etch Combinatorial ProcessingYang hong sheng·Filed 2011·Application pending·0 cites
- 2443US2014174921A1Multi-Piece Target and Magnetron to Prevent Sputtering of Target Backing MaterialsINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2542US2014130922A1Control Methods and Hardware Configurations for Ozone Delivery SystemsINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 2641US9175382B2High metal ionization sputter gunYang hong sheng·Filed 2011·Granted Nov 3, 2015·0 cites·12 claims
- 2737US2013270103A1Method Of Enabling And Controlling Ozone Concentration And FlowSHAO SHOUQIAN·Filed 2012·Application pending·0 cites
- 2834US2013153536A1Combinatorial processing using a remote plasma sourceSHAO SHOUQIAN·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →