Inventor · disambiguated record
Shyam Sridhar
Also filed as: SRIDHAR SHYAM
10 granted patents·12 pending applications·6 citations·filing 2017–2025
78Inventor score
Files withTOKYO ELECTRON LTD22
Top patents by PatentIndex Score
22 records- 0190US12394600B2Balanced RF resonant antenna systemTOKYO ELECTRON LTD·Filed 2023·Granted Aug 19, 2025·2 cites·20 claims
- 0282US10529589B2Method of plasma etching of silicon-containing organic film using sulfur-based chemistryTOKYO ELECTRON LTD·Filed 2018·Granted Jan 7, 2020·4 cites·21 claims
- 0371US2025273439A1Method of uniformity controlTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0470US12300468B2Method of uniformity controlTOKYO ELECTRON LTD·Filed 2022·Granted May 13, 2025·0 cites·14 claims
- 0565US12217935B2Plasma processing methods using multiphase multifrequency bias pulsesTOKYO ELECTRON LTD·Filed 2022·Granted Feb 4, 2025·0 cites·20 claims
- 0662US12224160B2Topographic selective depositionTOKYO ELECTRON LTD·Filed 2023·Granted Feb 11, 2025·0 cites·20 claims
- 0761US2025273429A1Plasma potential adjustment circuitTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0859US2025293095A1System and method of pulse scoringTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0958US2025226192A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1058US2025266250A1Profile simulation calibration with in-situ sensor dataTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1157US2025079128A1Processing substrates with plasma modulated by dc magnetic fieldsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1257US2025226179A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1357US2024339297A1Plasma processing systems with matching network and methodsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1456US2025291076A1Grid-less ion angle detectorTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1556US2025292994A1Grid-less ion energy detectorTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1651US11637242B2Methods for resistive RAM (ReRAM) performance stabilization via dry etch clean treatmentTOKYO ELECTRON LTD·Filed 2020·Granted Apr 25, 2023·0 cites·10 claims
- 1751US2023377853A1Plasma systems and processes with pulsed magnetic fieldTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1850US2023377895A1Plasma etching using multiphase multifrequency power pulses and variable duty cyclingTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1946US11398386B2Plasma etch processesTOKYO ELECTRON LTD·Filed 2020·Granted Jul 26, 2022·0 cites·20 claims
- 2045US12009430B2Method for gate stack formation and etchingTOKYO ELECTRON LTD·Filed 2020·Granted Jun 11, 2024·0 cites·10 claims
- 2145US10811269B2Method to achieve a sidewall etchTOKYO ELECTRON LTD·Filed 2019·Granted Oct 20, 2020·0 cites·19 claims
- 2240US10115591B2Selective SiARC removalTOKYO ELECTRON LTD·Filed 2017·Granted Oct 30, 2018·0 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Shyam Sridhar files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →