Inventor · disambiguated record
Shinichiro Takami
Also filed as: TAKAMI SHINICHIRO
9 granted patents·11 pending applications·39 citations·filing 2002–2023
83Inventor score
Technology areasH10P
Top patents by PatentIndex Score
20 records- 0179US6626967B2Polishing composition and polishing method employing itFUJIMI INC·Filed 2002·Granted Sep 30, 2003·23 cites·8 claims
- 0274US12139643B2Polishing compositionFUJIMI INC·Filed 2023·Granted Nov 12, 2024·0 cites·13 claims
- 0374US9579769B2Composition for polishing purposes, polishing method using same, and method for producing substrateFUJIMI INC·Filed 2012·Granted Feb 28, 2017·3 cites·14 claims
- 0472US12110422B2Polishing method and polishing compositionFUJIMI INC·Filed 2023·Granted Oct 8, 2024·0 cites·15 claims
- 0570US9206336B2Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrateFUJIMI INC·Filed 2013·Granted Dec 8, 2015·2 cites·4 claims
- 0666US7597729B2Polishing composition and polishing method using the sameFUJIMI INC·Filed 2007·Granted Oct 6, 2009·2 cites·9 claims
- 0765US2023063355A1Gallium compound-based semiconductor substrate polishing compositionFUJIMI INC·Filed 2022·Application pending·0 cites
- 0862US7052522B2Polishing composition and polishing method using the sameFUJIMI INC·Filed 2003·Granted May 30, 2006·9 cites·20 claims
- 0959US2024199915A1Polishing compositionFUJIMI INC·Filed 2022·Application pending·0 cites
- 1059US2024117218A1Polishing method and polishing compositionFUJIMI INC·Filed 2022·Application pending·0 cites
- 1156US2022243093A1Polishing compositionFUJIMI INC·Filed 2020·Application pending·0 cites
- 1252US2021024781A1Gallium compound-based semiconductor substrate polishing compositionFUJIMI INC·Filed 2019·Application pending·0 cites
- 1347US2023235194A1Polishing method and polishing composition setFUJIMI INC·Filed 2021·Application pending·0 cites
- 1447US2024117219A1Polishing compositionFUJIMI INC·Filed 2022·Application pending·0 cites
- 1546US2023136485A1Polishing compositionFUJIMI INC·Filed 2021·Application pending·0 cites
- 1644US9685343B2Method for producing polished object and polishing composition kitFUJIMI INC·Filed 2014·Granted Jun 20, 2017·0 cites·10 claims
- 1744US2006080896A1Polishing composition and polishing method using the sameTAKAMI SHINICHIRO·Filed 2005·Application pending·0 cites
- 1840US2015166838A1Polishing composition, manufacturing process therefor, undiluted liquid, process for producing silicon substrate, and silicon substrateFUJIMI INC·Filed 2013·Application pending·0 cites
- 1939US2015014579A1Polishing composition and method for producing semiconductor substrateFUJIMI INC·Filed 2013·Application pending·0 cites
- 2036US11897081B2Method for polishing silicon substrate and polishing composition setFUJIMI INC·Filed 2017·Granted Feb 13, 2024·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →