Inventor · disambiguated record
Shiro Tan
Also filed as: TAN SHIRO
36 granted patents·3 pending applications·497 citations·filing 1988–2014
98Inventor score
Top patents by PatentIndex Score
39 records- 0181US6830872B2Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compoundFUJI PHOTO FILM CO LTD·Filed 2002·Granted Dec 14, 2004·13 cites·17 claims
- 0281US6114089APositive working photosensitive lithographic printing plateFUJI PHOTO FILM CO LTD·Filed 1998·Granted Sep 5, 2000·32 cites·2 claims
- 0378US6709800B2Presensitized plate for preparing lithographic printing plateFUJI PHOTO FILM CO LTD·Filed 2002·Granted Mar 23, 2004·16 cites·10 claims
- 0478US6042991APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1998·Granted Mar 28, 2000·49 cites·8 claims
- 0577US7105270B2Fluoroaliphatic group-containing copolymerFUJI PHOTO FILM CO LTD·Filed 2003·Granted Sep 12, 2006·16 cites·4 claims
- 0677US6740470B2Lithographic printing plate precursorFUJI PHOTO FILM CO LTD·Filed 2002·Granted May 25, 2004·15 cites·21 claims
- 0777US6416925B1Positive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jul 9, 2002·13 cites·6 claims
- 0876US6780562B2Lithographic printing plate precursorFUJI PHOTO FILM CO LTD·Filed 2001·Granted Aug 24, 2004·9 cites·14 claims
- 0976US4883739ALight-sensitive resin composition with 1,2-naphthoquinone diazide compound having spirobichroman or spirobiinoane ringFUJI PHOTO FILM CO LTD·Filed 1988·Granted Nov 28, 1989·25 cites·3 claims
- 1072US6136504APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Oct 24, 2000·30 cites·6 claims
- 1172US5340686APositive-type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·26 cites·6 claims
- 1269US6277541B1Photosensitive lithographic printing plateFUJI PHOTO FILM CO LTD·Filed 1999·Granted Aug 21, 2001·20 cites·13 claims
- 1365US9177921B2Manufacturing method of semiconductor deviceFUJIFILM CORP·Filed 2014·Granted Nov 3, 2015·1 cites·14 claims
- 1464US6517987B2Positive-working presensitized plate useful for preparing a lithographic printing plateFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 11, 2003·7 cites·8 claims
- 1560US6638683B1Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1998·Granted Oct 28, 2003·19 cites·8 claims
- 1660US5709977APositive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Jan 20, 1998·19 cites·7 claims
- 1759US6630280B1Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Oct 7, 2003·15 cites·13 claims
- 1859US6489080B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Dec 3, 2002·19 cites·12 claims
- 1959US5674657APositive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomersOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Oct 7, 1997·18 cites·14 claims
- 2058US5948587APositive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Sep 7, 1999·18 cites·7 claims
- 2155US5652081APositive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Jul 29, 1997·15 cites·8 claims
- 2254US5429905APositive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compoundFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jul 4, 1995·11 cites·7 claims
- 2353US6004721APositive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1998·Granted Dec 21, 1999·14 cites·4 claims
- 2452US6692883B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 17, 2004·3 cites·19 claims
- 2552US6660445B2Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compoundFUJI PHOTO FILM CO LTD·Filed 2001·Granted Dec 9, 2003·3 cites·5 claims
- 2649US5380618AMicropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solventFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jan 10, 1995·10 cites·7 claims
- 2747US6379860B1Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1998·Granted Apr 30, 2002·11 cites·2 claims
- 2847US5358824APhotosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ringFUJI PHOTO FILM CO LTD·Filed 1993·Granted Oct 25, 1994·9 cites·1 claims
- 2946US6207343B1Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Mar 27, 2001·12 cites·7 claims
- 3046US2015093879A1Temporary adhesive for production of semiconductor device, and adhesive support and production method of semiconductor device using the sameFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3145US5494773APositive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol groupFUJI PHOTO FILM CO LTD·Filed 1995·Granted Feb 27, 1996·9 cites·4 claims
- 3245US2014318697A1Manufacturing method of semiconductor deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3344US5683851APositive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Nov 4, 1997·8 cites·12 claims
- 3442US2006040115A1FilmFUJI PHOTO FILM CO LTD·Filed 2005·Application pending·0 cites
- 3538US5620828APositive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution acceleratorFUJI PHOTO FILM CO LTD·Filed 1995·Granted Apr 15, 1997·5 cites·3 claims
- 3637US7144678B2Lithographic printing plate precursorFUJI PHOTO FILM CO LTD·Filed 2002·Granted Dec 5, 2006·0 cites·15 claims
- 3736US5576139APositive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalystFUJI PHOTO FILM CO LTD·Filed 1991·Granted Nov 19, 1996·3 cites·7 claims
- 3835US5318875APositive quinonediazide photoresist composition containing select hydroxyphenol additiveFUJI PHOTO FILM CO LTD·Filed 1993·Granted Jun 7, 1994·3 cites·5 claims
- 3931US5324618APositive type quinonediazide photoresist composition containing select tetraphenolic additiveFUJI PHOTO FILM CO LTD·Filed 1992·Granted Jun 28, 1994·1 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Shiro Tan files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →