Inventor · disambiguated record
Sheng-Hung Tu
Also filed as: TU SHENG-HUNG
8 granted patents·2 pending applications·25 citations·filing 2010–2018
81Inventor score
Technology areasH10P
Top patents by PatentIndex Score
10 records- 0190US9546321B2Compositions and methods for selectively etching titanium nitrideBARNES JEFFREY A·Filed 2012·Granted Jan 17, 2017·11 cites·20 claims
- 0286US10392560B2Compositions and methods for selectively etching titanium nitrideENTEGRIS INC·Filed 2017·Granted Aug 27, 2019·4 cites·17 claims
- 0381US10651045B2Compositions and methods for etching silicon nitride-containing substratesENTEGRIS INC·Filed 2018·Granted May 12, 2020·3 cites·20 claims
- 0477US10472567B2Compositions and methods for selectively etching titanium nitrideENTEGRIS INC·Filed 2014·Granted Nov 12, 2019·4 cites·14 claims
- 0575US10428271B2Compositions and methods for selectively etching titanium nitrideENTEGRIS INC·Filed 2014·Granted Oct 1, 2019·3 cites·16 claims
- 0647US10790187B2Post-etch residue removal for advanced node beol processingENTEGRIS INC·Filed 2018·Granted Sep 29, 2020·0 cites·14 claims
- 0743US10340150B2Ni:NiGe:Ge selective etch formulations and method of using sameENTEGRIS INC·Filed 2014·Granted Jul 2, 2019·0 cites·12 claims
- 0843US9765288B2Compositions for cleaning III-V semiconductor materials and methods of using sameENTEGRIS INC·Filed 2013·Granted Sep 19, 2017·0 cites·19 claims
- 0938US2015075570A1Methods for the selective removal of ashed spin-on glassADVANCED TECH MATERIALS·Filed 2013·Application pending·0 cites
- 1034US2012021961A1Composition for post chemical-mechanical polishing cleaningKLIPP ANDREAS·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →