Inventor · disambiguated record
Shintaro Yamada
Also filed as: YAMADA SHINTARO
40 granted patents·14 pending applications·129 citations·filing 2000–2024
96Inventor score
Files withROHM & HAAS ELECT MAT45SHIPLEY CO LLC2AQAD EMAD1DOW GLOBAL TECHNOLOGIES LLC1DUPONT ELECTRONIC MAT INTERNATIONAL LLC1
Top patents by PatentIndex Score
54 records- 0196US9442377B1Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 13, 2016·19 cites·14 claims
- 0295US10031420B2Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2016·Granted Jul 24, 2018·13 cites·14 claims
- 0393US9156785B2Base reactive photoacid generators and photoresists comprising sameAQAD EMAD·Filed 2011·Granted Oct 13, 2015·9 cites·10 claims
- 0491US9029065B2Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an articleROHM & HAAS ELECT MAT·Filed 2012·Granted May 12, 2015·7 cites·20 claims
- 0591US8900794B2Photoacid generator and photoresist comprising sameROHM & HAAS ELECT MAT·Filed 2012·Granted Dec 2, 2014·7 cites·22 claims
- 0689US9334357B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2015·Granted May 10, 2016·4 cites·11 claims
- 0789US6399273B1Water-processable photoresist compositionsUNIV TEXAS·Filed 2000·Granted Jun 4, 2002·41 cites·32 claims
- 0888US11042093B2Gap-filling methodROHM & HAAS ELECT MAT·Filed 2018·Granted Jun 22, 2021·2 cites·10 claims
- 0988US10114288B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Oct 30, 2018·3 cites·16 claims
- 1081US12287576B2Underlayer compositions and patterning methodsDUPONT ELECTRONIC MAT INTERNATIONAL LLC·Filed 2024·Granted Apr 29, 2025·0 cites·20 claims
- 1181US9507259B2Photoresist compositionLI MINGQI·Filed 2012·Granted Nov 29, 2016·4 cites·14 claims
- 1281US9136123B2Hardmask surface treatmentROHM AND HAAS ELECTRONICS MATERIALS LLC·Filed 2013·Granted Sep 15, 2015·5 cites·16 claims
- 1380US10790146B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2017·Granted Sep 29, 2020·3 cites·14 claims
- 1478US10007184B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Jun 26, 2018·1 cites·10 claims
- 1574US9880469B2Resins for underlayersROHM & HAAS ELECT MAT·Filed 2015·Granted Jan 30, 2018·1 cites·19 claims
- 1673US9753370B2Multiple-pattern forming methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 5, 2017·2 cites·13 claims
- 1771US10886119B2Aromatic underlayerROHM & HAAS ELECT MAT·Filed 2019·Granted Jan 5, 2021·1 cites·11 claims
- 1870US2022066321A1Underlayer compositions and patterning methodsROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 1969US11733609B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2021·Granted Aug 22, 2023·0 cites·13 claims
- 2067US9540476B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2014·Granted Jan 10, 2017·1 cites·13 claims
- 2166US9448486B2Photoresist pattern trimming compositions and methodsROHM & HAAS ELECT MAT·Filed 2014·Granted Sep 20, 2016·1 cites·18 claims
- 2265US9601325B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2015·Granted Mar 21, 2017·1 cites·10 claims
- 2365US9436082B2Compositions comprising base-reactive component and processes for photolithographyWANG DEYAN·Filed 2011·Granted Sep 6, 2016·1 cites·9 claims
- 2465US9146470B2Photoacid generator and photoresist comprising sameROHM & HAAS ELECT MAT·Filed 2014·Granted Sep 29, 2015·0 cites·7 claims
- 2564US2024264528A1Photoresist underlayer compositions and methods of forming electronic devicesROHM & HAAS ELECT MAT·Filed 2023·Application pending·0 cites
- 2663US2019146343A1Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
- 2762US2018253006A1Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
- 2860US12411409B2Aromatic underlayerROHM & HAAS ELECT MAT·Filed 2021·Granted Sep 9, 2025·0 cites·13 claims
- 2956US10818493B2Silicon-based hardmaskROHM & HAAS ELECT MAT·Filed 2018·Granted Oct 27, 2020·0 cites·11 claims
- 3055US2023103371A1Photoresist underlayer compositionROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
- 3154US11940732B2Coating compositions and methods of forming electronic devicesROHM & HAAS ELECT MAT·Filed 2021·Granted Mar 26, 2024·0 cites·18 claims
- 3253US12313971B2Coated underlayer for overcoated photoresistROHM & HAAS ELECT MAT·Filed 2021·Granted May 27, 2025·0 cites·16 claims
- 3353US7132214B2Polymers and photoresist compositions for short wavelength imagingSHIPLEY CO LLC·Filed 2001·Granted Nov 7, 2006·3 cites·5 claims
- 3452US12379660B2Adhesion promoting photoresist underlayer compositionROHM & HAAS ELECT MAT·Filed 2020·Granted Aug 5, 2025·0 cites·18 claims
- 3552US9296879B2HardmaskROHM & HAAS ELECT MAT·Filed 2013·Granted Mar 29, 2016·0 cites·16 claims
- 3650US9809672B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Nov 7, 2017·0 cites·13 claims
- 3750US2020379347A1Resist underlayer compositions and pattern formation methods using such compositionsROHM & HAAS ELECT MAT·Filed 2019·Application pending·0 cites
- 3849US11817316B2Coating compositions and methods of forming electronic devicesROHM & HAAS ELECT MAT·Filed 2021·Granted Nov 14, 2023·0 cites·16 claims
- 3949US11175581B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2017·Granted Nov 16, 2021·0 cites·12 claims
- 4048US11360387B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2018·Granted Jun 14, 2022·0 cites·15 claims
- 4148US10377848B2Aromatic resins for underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Aug 13, 2019·0 cites·11 claims
- 4248US10186424B2Silicon-based hardmaskROHM & HAAS ELECT MAT·Filed 2017·Granted Jan 22, 2019·0 cites·8 claims
- 4348US9563126B2HardmaskROHM & HAAS ELECT MAT·Filed 2015·Granted Feb 7, 2017·0 cites·11 claims
- 4447US12099300B2Aromatic underlayerROHM & HAAS ELECT MAT·Filed 2019·Granted Sep 24, 2024·0 cites·13 claims
- 4546US11762294B2Coating composition for photoresist underlayerROHM & HAAS ELECT MAT·Filed 2020·Granted Sep 19, 2023·0 cites·18 claims
- 4646US2022197141A1Photoresist underlayer compositions and patterning methodsROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 4746US2023194990A1Photoresist underlayer compositionROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 4846US2022197142A1Photoresist underlayer compositions and patterning methodsROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 4945US2020348592A1Resist underlayer compositions and methods of forming patterns with such compositionsROHM & HAAS ELECT MAT·Filed 2019·Application pending·0 cites
- 5043US11506979B2Method using silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2017·Granted Nov 22, 2022·0 cites·14 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Shintaro Yamada files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →