Inventor · disambiguated record
Shigeru Yoshikawa
Also filed as: YOSHIKAWA SHIGERU
12 granted patents·7 pending applications·279 citations·filing 1980–2023
90Inventor score
Top patents by PatentIndex Score
19 records- 0196US11698080B2Sealing systemEBARA CORP·Filed 2022·Granted Jul 11, 2023·3 cites·8 claims
- 0293US6897395B2Mail sorterTSUBAKIMOTO CHAIN CO·Filed 2003·Granted May 24, 2005·157 cites·2 claims
- 0387US4491851AMethod and circuit for driving an ink jet printerFUJITSU LTD·Filed 1980·Granted Jan 1, 1985·39 cites·5 claims
- 0486US11441571B2Sealing systemEBARA CORP·Filed 2018·Granted Sep 13, 2022·3 cites·6 claims
- 0577US5314078AFirst-in first-out article storage rack apparatusTSUBAKIMOTO CHAIN CO·Filed 1992·Granted May 24, 1994·56 cites·4 claims
- 0671US8591612B2Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the sameHITACHI CHEMICAL CO LTD·Filed 2013·Granted Nov 26, 2013·2 cites·16 claims
- 0762US2024115835A1Dilator and catheter assemblyTERUMO CORP·Filed 2023·Application pending·0 cites
- 0849US2007093183A1Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the sameHITACHI CHEMICAL CO LTD·Filed 2006·Application pending·0 cites
- 0948US2017133237A1Polishing liquid and method for polishing substrate using the polishing liquidHITACHI CHEMICAL CO LTD·Filed 2016·Application pending·0 cites
- 1047US2020408219A1Pump and sealing systemEBARA CORP·Filed 2018·Application pending·0 cites
- 1146US2019321616A1Medical device and method for manufacturing the sameTERUMO CORP·Filed 2019·Application pending·0 cites
- 1245US9564337B2Polishing liquid and method for polishing substrate using the polishing liquidOOTA MUNEHIRO·Filed 2011·Granted Feb 7, 2017·0 cites·7 claims
- 1343US9966269B2Polishing liquid for CMP, polishing liquid set for CMP, and polishing methodHITACHI CHEMICAL CO LTD·Filed 2015·Granted May 8, 2018·0 cites·6 claims
- 1442US6979793B2Mail sorting and distributing transfer systemTSUBAKIMOTO CHAIN CO·Filed 2003·Granted Dec 27, 2005·7 cites·4 claims
- 1535US2012214307A1Chemical-mechanical polishing liquid, and semiconductor substrate manufacturing method and polishing method using said polishing liquidYOSHIKAWA SHIGERU·Filed 2010·Application pending·0 cites
- 1635US2017276176A1Bearing apparatus and pumpEBARA CORP·Filed 2015·Application pending·0 cites
- 1733US5277640AFrit seal furnace and mount for cathode-ray tubeSONY CORP·Filed 1991·Granted Jan 11, 1994·7 cites·1 claims
- 1829US8592317B2Polishing solution for CMP and polishing method using the polishing solutionSATOU EIICHI·Filed 2011·Granted Nov 26, 2013·0 cites·19 claims
- 1929US5248472AMethod of and apparatus for manufacturing tubular thermoplastic resin film having a rough inner surfaceTERUMO CORP·Filed 1992·Granted Sep 28, 1993·5 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →